In order to select the supporting points for large glass panels used for TFT-LCD monitors, an optimization method selecting the supporing points is presented. In this method we reduce the problem of 1 degree of freedom. ANSYS optimization module is used and optimization criterion is to minimize the maximum deflection.

The expansion of the display market could mass-produce the product which becomes the super-slim and ultra-lighting according to the demand of customer. This change etched the mobile display panel in order to make the thin glass. The wet etching refers to the process of removing selectively the unnecessary part in order to form the circuit pattern among the semi-conductor or the LCD manufacturing process. The wet etching can progress the etching about a large amount at a time but the thickness of glass is not smooth or not etched according to the process condition. In this study, the defect factor in the etching process tries to be analyze. The experimental design was established and the processing condition was optimized in order to minimize under non-etch part generation by the experiment of design.

A zinc oxide (ZnO) hybrid structure was successfully fabricated on a glass substrate by metal organic chemical vapor deposition (MOCVD). In-situ growth of a multi-dimensional ZnO hybrid structure was achieved by adjusting the growth temperature to determine the morphologies of either film or nanorods without any catalysts such as Au, Cu, Co, or Sn. The ZnO hybrid structure was composed of one-dimensional (1D) nanorods grown continuously on the two-dimensional (2D) ZnO film. The ZnO film of 2D mode was grown at a relatively low temperature, whereas the ZnO nanorods of 1D mode were grown at a higher temperature. The change of the morphologies of these materials led to improvements of the electrical and optical properties. The ZnO hybrid structure was characterized using various analytical tools. Scanning electron microscopy (SEM) was used to determine the surface morphology of the nanorods, which had grown well on the thin film. The structural characteristics of the polycrystalline ZnO hybrid grown on amorphous glass substrate were investigated by X-ray diffraction (XRD). Hall-effect measurement and a four-point probe were used to characterize the electrical properties. The hybrid structure was shown to be very effective at improving the electrical and the optical properties, decreasing the sheet resistance and the reflectance, and increasing the transmittance via refractive index (RI) engineering. The ZnO hybrid structure grown by MOCVD is very promising for opto-electronic devices as Photoconductive UV Detectors, anti-reflection coatings (ARC), and transparent conductive oxides (TCO).

A laser glass cutting system using a femto-second laser was evaluated for Flat Panel Display (FPD) glass. A theoretical analysis of the ablation threshold and depth is described using an explicit analytic form. Experiments for clean and deep grooves were performed using a 3W femto-second laser, and the relationships between the input energy and the scribing depth as well as the threshold energy are presented. Mechanical breaking after the scribing process was carried out and the results are compared with a theoretical method. It was found that a two-sided LCD panel glass can be cut clearly using the laser cutting method. The methodology was found to be very effective as a mass-production cutting system.

rf-마그네트론 스퍼터링 방법을 이용하여 높은 광투과성을 지니며 c-축 배향된 KLN 박막을 제작하였다. 하소 및 소결 과정을 거쳐서 균일하고 안정한 상태의 KLN 타겟을 제조하였다. KLN 타겟은 화학량론적인 조성 및 K가 30%, 60%, 그리고 Li가 각각 15%, 30% 과량된 조성을 사용하였으며 K와 Li의 휘발을 방지하기 위하여 낮은 온도에서 소결시켰다. 제조된 타겟을 사용하여 rf-magnetron sputtering 방법으로 박막을 제조하였으며, 이때 K가 60% Li가 30% 과량된 타겟으로 제조할 때 단일상의 KLN 박막을 얻을 수 있었다. KLN 박막은 코닝 1737 기판 위에서 우수한 결정성과 높은 c-축 배향성을 나타내었으며, 이때 박막의 성장조건은 고주파 전력 100 W, 공정 압력 150 mTorr, 기판 온도 580˚C였다. 가시광 영역에서 박막의 투과율은 약 90% 이고, 흡수는 333 nm에서 발생하였으며 632.8 nm에서 박막의 굴절율은 1.93이었다.

재래식과 마이크로파 열원으로 알루미나 기판을 PbO-ZnO-B2O3계 유리로 봉착하였을 때, 봉착용 유리의 결정화 거동 및 알루미나 기판과의 봉착상태를 조사하였다. 재래식 열처리된 시편에 비하여 마이크로파 열처리된 시편은 짧은 시간과 낮은 온도에서 열처리 되었음에도 불구하고 모유리 내에서 PbTiO3 결정이 잘 성장하였고, 높은 결정화를 보여주었다. 또한, 마이크로파 봉착 시편은 양호한 상태를 보여주었고, 봉착 곡강도는 거의 비슷하였다.

평판디스플레이용 진공패널의 제작시 진공으로 유지된 패널을 구성하는 유리판이 받는 응력과 변위를 계산하였다. 유리판의 두께, 패널의 크기 및 실링폭의 크기를 변수로 하여 실제로 진공패널을 제작한 후 패널의 파괴양상과 변위를 측정하였다. 유리판의 파괴양상과 변형측정을 통하여 유리판에 걸리는 최대응력은 테두리부분에 걸리는 것을 확인하였다. 제작된 진공패널이 갖는 응력분포 및 변위의 분포는 패널을 진공실링할 때 사용한 실런트의 폭에 크게 의존하였다. 패널의 실링폭이 커질수록 모서리가 완전 고정된 조건으로 계산한 결과와 유사하였다. 두께가 3mm인 유리판을 사용해서 80×120textrmmm2</TEX> 크기의 패널을 제작할 때 실링폭이 20mm인 경우 측정된 변위는 57μm였으며, 이 값은 모서리가 완전히 고정된 조건으로 계산한 갈인 54μm와 비슷하였다.