As the fabrication technology used in FPDs(flat-panel displays) advances, the size of these panels is increasing and the pattern size is decreasing to the um range. Accordingly, a cleaning process during the FPD fabrication process is becoming more important to prevent yield reductions. The purpose of this study is to develop a FPD cleaning system and a cleaning process using a two-phase flow. The FPD cleaning system consists of two parts, one being a cleaning part which includes a two-phase flow nozzle, and the other being a drying part which includes an air-knife and a halogen lamp. To evaluate the particle removal efficiency by means of two-phase flow cleaning, silica particles 1.5μm in size were contaminated onto a six-inch silicon wafer and a four-inch glass wafer. We conducted cleaning processes under various conditions, i.e., DI water and nitrogen gas at different pressures, using a two-phase-flow nozzle with a gap distance between the nozzle and the substrate. The drying efficiency was also tested using the air-knife with a change in the gap distance between the air-knife and the substrate to remove the DI water which remained on the substrate after the two-phase-flow cleaning process. We obtained high efficiency in terms of particle removal as well as good drying efficiency through the optimized conditions of the two-phase-flow cleaning and air-knife processes.

In recent years, researchers have put a considerable effort to decrease the emission of harmful gaseous pollutants to the atmosphere. In order to remove simultaneously SO₂ and NOx from the flue gas of small and medium-sized ship, we designed minimal wet scrubber inside a compact multistage modular system. In this study we proceed experiment of elemental technology at each stage of the scrubber. The each stage is oxidation of NO which is the main component of NOx, and removal of SO₂, respectively. NaClO₂ was used to oxidize NO gas, and NaOH was used to remove SO₂gas. The maximum NO conversion efficiency and the SO₂ removal ficiency are both indicate 100%.

원자력이용시설에서 발생한 작은 크기의 금속 조각들을 효과적으로 제염하는 스마트 장치를 개발하였다. 이 장치는 자성연 마재를 포함한 영역의 자속밀도를 연속적으로 변화시키는 방법과 초음파를 이용하는 다중 제염장치이다. 한편, 제염 효율을 높이기 위해 제염 장치가 제염 대상 전체에 작용하도록 장치들의 구성을 수정하였다. 개발된 장치들의 최적 작동조건을 도 출하여 샘플로 선정한 소형의 금속방사성페기물에 대하여 자기장과 초음파제염을 각각 15분간 실시하였다. 그 결과 제염계 수의 범위는18~56으로 크게 향상되었으며 제염 후 모든 샘플은 백그라운드(BKG)값 이하로 확인되었다.

In aquaculture operations with nets including scallop aquaculture, there exist many problems as the management of fishing gears is dependent on the traditional method that has been using the pure labor forces. These give rise to the environmental contamination and increase of total fishery costs because they prevent the fishermen from reusing the fishing gears. Due to the eco-friendly issues and aggravation of the management cost, the need to automate the washing operation of the fishing gears has been required consistently. In this study, development of scallop fishing gear washing apparatus was carried out. We conducted the preliminary experiments applying Taguchi experimental method in order to find the influential factors and optimal levels to the washing performance. Based on these result, we designed the structure and the kinematic mechanism of the fishing gear washer. Final prototype was verified to be effective in maximizing the washing rate through the performance test.

본 연구는 정밀여과용 관형 분리막 모듈 내에 자체 설계한 기체분사형 노즐을 장착하여 막오염 감소 효과에 따른 투과유속을 측정하였다. 원료 용액으로는 0.1 wt% yeast 입자를 사용하였으며 공기 주입에 따른 막오염 감소 효과를 확인하기 위하여 공기를 주입하지 않은 경우와 주입한 경우의 투과유속을 비교⋅분석하였다. 공기를 주입하지 않았을 경우 투과유속은 지속적으로 감소하였지만 공기를 주입할 경우 투과유속은 공기를 주입하지 않은 경우와 비교하여 30% 이상 향상됨을 확인 하였다.

Recently nanoscience and nanotechnology have been studied intensively, and many plants, insects, and animals in nature have been found to have nanostructures in their bodies. Among them, lotus leaves have a unique nanostructure and microstructure in combination and show superhydrophobicity and a self-cleaning function to wipe and clean impurities on their surfaces. Coating films with combined nanostructures and microstructures resembling those of lotus leaves may also have superhydrophobicity and self-cleaning functions; as a result, they could be used in various applications, such as in outfits, tents, building walls, or exterior surfaces of transportation vehicles like cars, ships, or airplanes. In this study, coating films were prepared by dip coating method using polypropylene polymers dissolved in a mixture of solvent, xylene and non-solvent, methylethylketon, and ethanol. Additionally, attempts were made to prepare nanostructures on top of microstructures by coating with the same coating solution with an addition of carbon nanotubes, or by applying a carbon nanotube over-coat on polymer coating films. Coating films prepared without carbon nanotubes were found to have superhydrophobicity, with a water contact angle of 152˚ and sliding angle less than 2˚. Coating films prepared with carbon nanotubes were also found to have a similar degree of superhydrophobicity, with a water contact angle of 150 degrees and a sliding angle of 3 degrees.

This study shows the effects of deionized (DI) rinse and oxide HF wet etch processes on silicon substrate during a photolithography process. We found a fail at the wafer center after DI rinse step, called Si pits, during the fabrication of a complementary metal-oxide-semiconductor (CMOS) device. We tried to find out the mechanism of the Si pits by using the silicon wafer on CMOS fabrication and analyzing the effects of the friction charge induced by the DI rinsing. The key parameters of this experiment were revolution per minute (rpm) and time. An incubation time of above 10 sec was observed for the formation of Si pits and the rinsing time was more effective than rpm on the formation of the Si pits. The formation mechanism of the Si pits and optimized rinsing process parameters were investigated by measuring the charging level using a plasma density monitor. The DI rinse could affect the oxide substrate by a friction charging phenomenon on the photolithography process. Si pits were found to be formed on the micro structural defective site on the Si substrate under acceleration by developed and accumulated charges during DI rinsing. The optimum process conditions of DI rinse time and rpm could be established through a systematic study of various rinsing conditions.

The object of this research is to conform of practicable possibility and recycling of producing junk after citrus fruits is processed. With extracting d-limonene oil that have 70~90% a component of oil out of junk citrus peel, making certain the about 12000ppm concentration of it. Limonene derived from citrus in jeju using conventional synthetic detergents can be replaced with the development of environmentally friendly natural detergent investigated the possibility. Mostly due to ocean dumping, disposal and cause environmental problems by recycling natural citrus cleaner alternative to the research conducted on the possibility. Cleaning efficiency with temperature did not affect the largest concentrations were able to identify the difference between cleaning efficiency. At least 10% of the d-limonene oil could be from the cleaning performance, increasing the concentration of the cleaning efficiency was increased in size. Ultrasonic is very high removal efficiency under the conditions shown in the cause of pure self-generated ultrasonic cleaning power as co-effects of d-limonene oil appears to chemical cleaning effect of ultrasonic cavitation occurs in the physical cleaning effect due to a combination of synergistic stability is maximized by low concentrations of d-limonene oil in a short time showed an excellent cleaning ability. Having the ability of cleaning at the same time, considering the side recycling in the junk citrus peels reflects possibility of basic materials utility eco-friendly in the skin soap, bath soap, cosmetics etc, through ability of exclusion a contaminant in based cleaning effect(EC) it can prospect substitution effect environmentally in the pre existence synthetic detergents.

This paper investigates the dependence of a-Si:H/c-Si passivation and heterojunction solar cell performances on various cleaning processes of silicon wafers. It is observed that the passivation quality of a-Si:H thin-films on c-Si wafers depends highly on the initial H-termination properties of the wafer surface. The effective minority carrier lifetime (MCLT) of highly H-terminated wafer is beneficial for obtaining high quality passivation of a-Si:H/c-Si. The wafers passivated by p(n)-doped a-Si:H layers have low MCLT regardless of the initial H-termination quality. On the other hand, the MCLT of wafers incorporating intrinsic (i) a-Si:H as a passivation layer shows sensitive variation with initial cleaning and H-termination schemes. By applying the improved cleaning processes, we can obtain an MCLT of 100μsec after H-termination and above 600μsec after i a-Si:H thin film deposition. By adapting improved cleaning processes and by improving passivation and doped layers, we can fabricate a-Si:H/c-Si heterojunction solar cells with an active area conversion efficiency of 18.42%, which cells have an open circuit voltage of 0.670V, short circuit current of 37.31 mA/cm2 and fill factor of 0.7374. These cells show more than 20% pseudo efficiency measured by Suns-Voc with an elimination of series resistance.