유류를 포함한 HNS의 물동량이 증가 추세에 있음에도 불구하고, 우리나라에서는 HNS 해상운송 중에 발생한 사고의 분석과 위험에 관한 연구가 미진하다. HNS는 형태와 종류가 다양하고 사고발생시 피해가 심각하게 나타난다. 액체화물운반선(유조선, 케미컬탱커선, 액화가스탱커선 등)의 사고에 대한 원인을 분석하고 위험성에 대한 연구가 필요하다.

본 연구에서는 서로 다른 터치스크린용 Ag pastes를 스크린 인쇄 방식으로 ITO film 위에 전도성 패턴을 형성하고 10장씩 인쇄하여 130℃ 10분 동안 건조 하였다. 여기서 130℃ 10분의 건조 조건은 ITO film의 열화가 발생하지 않는 조건이다. 신뢰성 테스트는 염수테스트와 고온고습테스트를 진행한다. 각 테스트는 2장씩의 전도성 패턴 상태를 확인한다. 전도성 패턴을 침적 시킨 염수(NaCl 5% 녹인 증류수)를박스형 열풍 건조기(35℃)에서각 24, 48, 72시간 마다 상태를 확인하고 고온고습기(60℃ 90%)에서는 각120, 240시간 마다 상태를 확인하였다. 이런 신뢰성 테스트를 통해 서로 다른 Ag pastes의 접착력, 전도성의 변화 등을 알 수 있어 품질 저하를 막을 수 있고, 신뢰성 테스트에서 표면의 산소함량이 많은 Ag paste는 변색이 빨리 올 수 있음을 알 수 있었다.

We constructed two test server systems for KMTNet data management. One is the photometry database server which is optimized for stable operation, and the other is the photometric data process server which is optimized for fast I/O between devices. The performances of servers and data storage units were tested using various methods. Database upload was also checked using five different methods. From tests, we concluded that the most efficient method to upload photometric data processing results to database is the use of three nodes with job scheduler under the InnoDB engine. In this study we provide the test results for prototype servers for KMTNet data management.

The very high temperature gas reactor (VHTR) is one of the next generation nuclear reactors for its safety, long-term stability, and proliferation-resistance. The high operating temperature of over 800˚C enables various applications with high energy efficiency. Heat is transferred from the primary helium loop to the secondary helium loop through the intermediate heat exchanger (IHX). The IHX material requires creep resistance, oxidation resistance, and corrosion resistance in a helium environment at high operating temperatures. A Ni-based superalloy such as Alloy 617 is considered as a primary candidate material for the intermediate heat exchanger. In this study, the microstructures of Alloy 617 crept in pure helium and air environments at 950˚C were observed. The rupture time in helium was shorter than that in air under small applied stresses. As the exposure time increased, the thickness of outer oxide layer of the specimens clearly increased but delaminated after a long creep time. The depth of the carbide-depleted zone was rather high in the specimens under high applied stress. The reason was elucidated by the comparison between the ruptured region and grip region of the samples. It is considered that decarburization caused by minor gas impurities in a helium environment caused the reduction in creep rupture time.

We constructed a photometric database system which is optimally designed for microlensing events from KMTNet (Korea Microlensing Telescope Network) observation. We developed a framework software for the convenience of archiving, uploading, searching, and downloading of processed photometric data. From various tests for optimal data archiving engines, we found that the MyISAM storage engine shows the best performance. For the high performance of database system, data types of each field are carefully suggested from various combinations of tests especially to correct round-off errors. The developed framework provides the convenience of access to the database server using query forms via web pages, and displays the light curve of selected target for a quick view.

Methods of producing hydrogen include steam reforming, electrochemical decomposition of water, and the SI process. Among these methods, the Sulfur iodine process is one of the most promising processes for hydrogen production. The thermochemical sulfur-iodine (SI) process uses heat from a high-temperature-gas nuclear reactor to produce H2 gas; this process is known for its production of clean energy as it does not emit CO2 from water. But the SI-process takes place in an extremely corrosive environment for the materials. To endure SI environments, the materials for the SI environment will have to have strong corrosion resistance. This work studies the corrosion resistances of the Fe-Si, Ni-Ti and Ni Alloys, which are tested in SI-process environments. Among the SI-process environments, the conditions of boiling sulfuric acid and decomposed sulfuric acid are selected in this study. Before testing in boiling sulfuric acid environments, the specimens of Fe-4.5Si, Fe-6Si, Ni-4.5Si, Ni-Ti-Si-Nb and Ni-Ti-Si-Nb-B are previously given heat treatment at 1000˚C for 48 hrs. The reason for this heat treatment is that those specimens have a passive film on the surface. The specimens are immersed for 3~14 days in 98wt% boiling sulfuric acid. Corrosion rates are measured by using the weight change after immersion. The corrosion rates of the Fe-6Si and Ni-Ti-Si-Nb-B are found to decrease as the time passes. The corrosion rates of Fe-6si and Ni-Ti-Si-Nb-B are measured at 0.056 mm/yr and 0.16 mm/yr, respectively. Hastelloy-X, Alloy 617, Alloy 800H and Haynes 230 are tested in the decomposed sulfuric acid for one day. Alloy 800H was found to show the best corrosion resistance among the materials. The corrosion rate of Alloy 800H is measured at -0.35 mm/yr. In these results, the corrosion resistance of materials depends on the stability of the oxide film formed on the surface. After testing in boiling sulfuric acid and in decomposed sulfuric acid environments, the surfaces and compositions of specimens are analyzed by SEM and EDX.

We have designed data processing server system to include data archiving, photometric processing and light curve analysis for KMTNet (Korea Microlensing Telescope Network). Outputs of each process are reported to the main photometric database, which manages the whole processing steps and archives the photometric results. The database is developed using ORACLE 11g Release 2 engine. It allows to select objects applying any set of criteria such as RA/DEC coordinate and Star ID, etc. We tested the performance of the database using the OGLE photometric data. The searching time for querying 70,000,000 records was under 1 second. The database is fully accessed using query forms via web page.

Chromated Copper Arsenate (CCA)-treated wood has been widely used in Korea since 1980s, but the release of chromium, copper, and arsenic from the wood has been reported to cause environmental contamination. This study was aimed at investigating the environmental impact of brook water and sediment from the construction of cylindrical wood piles around a brook (partially immersed in the water) and wood bridge structures over the brook. Ten water and ten composite sediment samples (including one control for each) were collected from sites where a large number of treated wood structures were installed. Samples were analyzed for total chromium, copper, and arsenic using atomic absorption spectroscopy. Water contamination was not observed in all samples, but metal concentrations in the sediment samples were elevated at most sites, indicating the accumulation of metals in the sediment. This study suggested that the use of CCA-treated wood by continuos contact with water can lead to marked leaching of metal components and may ultimately cause health effects on aquatic organisms living on or in the sediment.

Silver coated copper composite powders were prepared by electroless plating method by controlling the activation and deposition process variables such as feeding rate of silver ions solution, concentration of reductant and molar ratio of activation solution at room temperature. The characteristics of the product were verified by using a scanning electron microscopy (SEM), X-ray diffraction (XRD) and atomic absorption (A.A.). It is noted that completely cleansing the copper oxide layers and protecting the copper particles surface from hydrolysis were important to obtain high quality Ag-Cu composite powders. The optimum conditions of Ag-Cu composite powder synthesis were molar ratio 4, concentration of reductant 15g/l and feeding rate of silver ions solution 2 ml/min.

In this study, BaTiO3 thin films were grown by RF-magnetron sputtering, and the effects of a post-annealing process on the structural characteristics of the BaTiO3 thin films were investigated. For the crystallization of the grown thin films, post-annealing was carried out in air at an annealing temperature that varied from 500-1000˚C. XRD results showed that the highest crystal quality was obtained from the samples annealed at 600-700˚C. From the SEM analysis, no crystal grains were observed after annealing at temperatures ranging from 500 to 600˚C; and 80 nm grains were obtained at 700˚C. The surface roughness of the BaTiO3 thin films from AFM measurements and the crystal quality from Raman analysis also showed that the optimum annealing temperature was 700˚C. XPS results demonstrated that the binding energy of each element of the thin-film-type BaTiO3 in this study shifted with the annealing temperature. Additionally, a Ti-rich phenomenon was observed for samples annealed at 1000˚C. Depth-profiling analysis through a GDS (glow discharge spectrometer) showed that a stoichiometric composition could be obtained when the annealing temperature was in the range of 500 to 700˚C. All of the results obtained in this study clearly demonstrate that an annealing temperature of 700˚C results in optimal structural properties of BaTiO3 thin films in terms of their crystal quality, surface roughness, and composition.

본 연구는 불소관능기인 perfluorocyclobutane (PFCB), fluorenyl, sulfonyl계 방향족 화합물을 동시에 포함하는 술폰화된 랜덤 고분자 전해질 막의 제조 및 그 특성에 관한 것이다. 이러한 고분자 전해질 막은 세단계의 합성, 즉 trifluorovinyloxy그룹을 양말단에 포함하는 단량체의 합성, 중부가반응 형태의 열중합, 그리고 chlorosulfonic acid를 이용한 후술폰화를 통하여 얻어졌다. 후술폰화 반응은 고분자 내에 포함된 fluorenyl기의 함량에 따라 일정한 몰비의 술폰화제 비율로 고정하여 진행되었으며, 이에 따라 다양한 이온교환 능력(IEC)을 가지는 고분자를 쉽게 합성할 수 있었다. 제조된 단량체 및 고분자들의 구조와 순도는 각각 FT-IR과 NMR 그리고 질량분석기를 통하여 확인되었다. 술폰화된 fluorenyl기가 많아질수록 술폰화도와 이온교환 능력이 증가하는 것을 확인할 수 있었고 그에 따른 함수율도 역시 증가하는 거동을 보였다. 술폰화된 고분자들의 이온전도도를 측정한 결과 술폰화도가 증가할수록 이온 전도도가 증가하는 것을 관찰할 수 있었다, 이렇게 제조된 전해질막 중 S-1과 S-2의 경우 다양한 온도범위(25sim80℃ 수식 이미지)에서 상용 전해질막인 Nafion-115를 능가하는 우수한 이온전도도를 나타냈다.

본 연구는 불소관능기인 perfluorocyclobutane (PFCB)과 fluorene계 방향족 화합물을 동시에 포함하는 술폰화된 고분자 전해질 막의 제조 및 그 특성에 관한 것이다. 이러한 고분자 전해질 막은 세 단계의 합성, 즉 trifluorovinyloxy그룹을 양말단에 포함하는 fluorene계 단량체의 합성, 중부가 반응 형태의 열중합, 그리고 chlorosulfonic acid를 이용한 후술폰화(post-sulfonation)를 통하여 얻어졌다. 후술폰화 반응은 일정한 시간과 온도 조건하에서 술폰화제의 첨가 비율을 달리하여 진행되었으며, 이에 따라 다양한 이온교환 능력(IEC)을 가지는 고분자를 합성할 수 있었다. 제조된 단량체 및 고분자들의 구조와 순도는 각각 FT-IR과 NMR 그리고 질량분석기를 통하여 확인되었다. 사용된 술폰화제의 양이 많아질수록 술폰화도와 이온교환 능력이 증가하는 것을 확인할 수 있었고 그에 따른 함수율도 역시 증가하는 거동을 보였다. 술폰화된 고분자들의 이온전도도를 측정한 결과 술폰화도가 증가할수록 이온 전도도가 증가하는 것을 관찰할 수 있었다. 이렇게 제조된 전해질막 중 IEC 값이 1.86 mmol/g인 고분자(sulfonated polymer 4)의 경우 다양한 온도범위(25~80℃)에서 상용 전해질막인 Nafion-115를 능가하는 우수한 이온전도도를 나타냈다.