Nano-oxide dispersion–strengthened (ODS) superalloys have attracted attention because of their outstanding mechanical reinforcement mechanism. Dispersed oxides increase the material’s strength by preventing grain growth and recrystallization, as well as increasing creep resistance. In this research, atomic layer deposition (ALD) was applied to synthesize an ODS alloy. It is useful to coat conformal thin films even on complex matrix shapes, such as nanorods or powders. We coated an Nb-Si–based superalloy with TiO2 thin film by using rotary-reactor type thermal ALD. TiO2 was grown by controlling the deposition recipe, reactor temperature, N2 flow rate, and rotor speed. We could confirm the formation of uniform TiO2 film on the surface of the superalloy. This process was successfully applied to the synthesis of an ODS alloy, which could be a new field of ALD applications.

In this study, we undertook detailed experiments to increase hydrogen production efficiency by optimizing the thickness of titanium dioxide (TiO2) thin films. TiO2 films were deposited on p-type silicon (Si) wafers using atomic layer deposition (ALD) technology. The main goal was to identify the optimal thickness of TiO2 film that would maximize hydrogen production efficiency while maintaining stable operating conditions. The photoelectrochemical (PEC) properties of the TiO2 films of different thicknesses were evaluated using open circuit potential (OCP) and linear sweep voltammetry (LSV) analysis. These techniques play a pivotal role in evaluating the electrochemical behavior and photoactivity of semiconductor materials in PEC systems. Our results showed photovoltage tended to improve with increasing thickness of TiO2 deposition. However, this improvement was observed to plateau and eventually decline when the thickness exceeded 1.5 nm, showing a correlation between charge transfer efficiency and tunneling. On the other hand, LSV analysis showed bare Si had the greatest efficiency, and that the deposition of TiO2 caused a positive change in the formation of photovoltage, but was not optimal. We show that oxide tunneling-capable TiO2 film thicknesses of 1~2 nm have the potential to improve the efficiency of PEC hydrogen production systems. This study not only reveals the complex relationship between film thickness and PEC performance, but also enabled greater efficiency and set a benchmark for future research aimed at developing sustainable hydrogen production technologies.

목적 : 소다-라임-실리카 유리(soda-lime-silica glass,SG) 기판위에 Ti, Ba-naphthenates를 출발원료로 사용하고 졸겔법으로 나노 결정질 TiO2, BaTiO3 박막을 제조하였다. 박막의 특성을 분석하기 위하여 X-선 회절 분석, 전자현미경, UV스펙트럼을 이용하여 연구하였다. 방법 : 코팅용액을 soda-lime-silica glass 기판 위에 스핀코팅하고 공기분위기에서 500℃에서 열분해시켜 박막을 제조하였다. 제조된 TiO2, BaTiO3 박막의 결정화도는 고분해능 X-선 회절분석법으로 그리고 표면미세구조와 거칠기는 전계 방출 현미경과 원자간력 현미경으로 또 자외선(200〜380 nm), 가시광선(380〜750 nm), 적외선(750〜900 nm) 영역의 투과율은 UV-Visible-NIR 분광광도계로 측정되었다. 결과 : TiO2박막은 아나타제 상이 존재하였으며, BaTiO3 박막은 최고 피크가 확인되지 않았다. 열처리한 TiO2, BaTiO3 박막의 가시광선 투과율은 80% 이상의 투과율을 나타냈으며, BaTiO3 박막은 TiO2 박막보다 자외선 및 청광 차단율이 높았다. 결론 : BaTiO3 박막은 TiO2 보다 자외선 및 청광에 대해 더 높은 차단율이 나타냈으며, 가시광선 투과율은 제조된 모든 박막에서 80% 이상의 투과율이 측정되었다.

To remove SO2 from flue gas, a thin film nanocomposite (TFN) hollow fiber membrane was decorated with Nafion/TiO2 nanoparticles. Morphological and structural analyses of the TFN membranes were performed using FTIR, SEM, EDX, TEM, and AFM. The gas permeation experiments were performed with pure gases and a mixed gas within a pressure range of 1-3 bar and feed gas flow rate of 0.03-0.15 L/min. The obtained experimental results suggest that the addition of Nf/TiO2 nanoparticles improved the membrane performance by introducing sulfonate and hydroxyl functional groups to the membrane, and thus increased SO2 permeability and selectivity. The SO2 permeability was found to be 411-1671 GPU, while the ideal selectivities achieved for SO2/N2 and SO2/CO2 were 2928 and 72, respectively. Overall, an SO2 removal efficiency of 93% was achieved by using the Nf/TiO2 incorporated TFN membrane.

TiO2 thin films consisting of positively charged poly(diallyldimethylammonium chloride)(PDDA) and negatively charged titanium(IV) bis(ammonium lactato) dihydroxide(TALH) were successfully fabricated on glass beads by a layer-by-layer(LBL) self-assembly method. The glass beads used here showed a positive charge in an acid range and negative charge in an alkaline range. The glass beads coated with the coating sequence of(PDDA/TALH)n showed a change in the surface morphology as a function of the number of bilayers. When the number of bilayers(n) of the(PDDA/TALH) thin film was 20, Ti element was observed on the surface of the coated glass beads. The thin films coated onto the glass beads had a main peak of the (101) crystal face and were highly crystallized with XRD diffraction peaks of anatase-type TiO2 according to an XRD analysis. In addition, the TiO2 thin films showed photocatalytic properties such that they could decompose a methyl orange solution under illumination with UV light. As the number of bilayers of the(PDDA/TALH) thin film increased, the photocatalytic property of the TiO2-coated glass beads increased with the increase in the thin film thickness. The surface morphologies and optical properties of glass beads coated with TiO2 thin films with different coating numbers were measured by field emission scanning electron microscopy(FE-SEM), X-ray diffraction(XRD) and by UV-Vis spectrophotometry(UV-vis).

A ZrO2 coating solution containing ZrO2 photo-catalysis, which is transparent in visible light, was prepared by the hydrolysis of alkoxide, and thin films on the SiO2 glass substrate were formed in a dipcoating method. These thin films were heat-treated at temperatures ranging from 250˚C-800˚C and their characteristics were subjected to thermal analysis, XRD, spectrometry, SEM, EDS, contact angle measurement, and AFM. Tetragonal ZrO2 phase was found in the thin film heat treated at 450˚C, and anatase TiO2 phase was detected in the thin film heat-treated at 600˚C and above. The thickness of the films was approximately 300 nm, and the roughness was 0.66 nm. Thus, the film properties are excellent. The films are super hydrophilic with a contact angle of 4.0˚; moreover, they have self-cleaning effect due to the photo catalytic property of anatase TiO2.

TiO2광촉매릉 반응성 스퍼터링법을 이웅하여 박막으로 제조하고 유기물 및 살균실험을 통하여 미세조직이 광촉매 효율에 미치는 영향을 조사하고자 하였다. 광촉매 효율측정을 위하여 페놀분해실험 및 E.coli 078을 이용한 살균실험을 행하였다. TiO2박막에 의한 페놀분해실험 시, 전자수용체인 산소의 공급에 의하여 분해효율이 2배까지 증가하였다. E.coli 078분해실험의 경우, 광촉매 TiO2박막을 사웅하여 살균하였을때 UV만 조사하여 살균하였을 경우 보다 분해효율이 최고 70% 이상 증가하였다. 페놀분해실험과 E.coli 078 살균실험 결과 저결정성 박막의 경우 분해능이 매우 미약하였으며, 표면조도가 높고 결정성이 우수한 박막의 경우에 높은 광촉매 효율을 나타내어TiO2박막의 광촉매 효과는 표면형상과 결정성이 매우 중요한 인자로 작용하였다.

고주파 마그네트론 반응성 스퍼터링(rf magnetron reactive sputtering)으로 티타늄산화물 박막을 제조하여 산소비율에 따른 반응성 스퍼터링의 증착기구를 조사하고 산소비율 및 기판온도에 따른 산화물 조성의 변화, 미세조직, 광학적 특성의 변화를 연구하였다. 기존의 진공기상증착법으로 증착만 박막에 비해, 금속타겟을 사용하여 높은 증착속도를 얻을 수 있는 반응성 마그네트론 스퍼터링으로 성막한 티타늄산화물 박막은 치밀도가 우수하여 높은 굴절률(2.06)과 높은 광투과율을 보였다. 상온에서 성막된 티타늄 산화물박막의 경우, 산소비율이 낮은 조건에서는 다결정형의조직을 보였으나 산소비율이 높은 경우에는 비정질조직을 나타냈으며, 기판온도가 300˚C 이상에서는 산소비율에 상관없이 다결정형의 조직을 나타냈다. 하지만 산소비율이 임계값이상에서는 박막의 조성, 증착속도 등이 거의 변하지 않는 안정된 증착조건을 보였다. 30% 이상의 산소비율의 반응성 스퍼터링의 조건에서는 TiO2의 조성의 박막으로 성장하여 약 3.82-3.87 eV의 band gap을 나타냈으며 기판온도의 증가에 따라 비정질 TiO2에서 다결정 TiO2으로 조직의 변화를 보여 광투과도도 약간 증가하는 경향을 나타냈다.

전기화학법 중 음극환원법을 이용하여 0.005M TiCI4수용액으로부터 수화물 형태의 TiO2박막을 제조하였다. TiCI4수용액에 첨가제로 에탄올을 50vol% 첨가하여 균일한 박막을 얻을 수가 있었으며, 전류밀도와 시간에 따라서 박막의 두께와 미세구조가 변화하였다. 성장속도가 큰 조건에서 얻은 박막은 균질성의 감소로 인하여 건조과정이나 열처리 중 다량의 균열이 발생하였다. 일정한 전류밀도ㅇ에서 반응시간의 증가에 따라 박막의 두께가 직선적으로 증가하였으며, 10mA/cm2의 전류밀도에서 3분 동안 반응시켜 약 0.7μm 두께의 우수한 TiO2박막을 얻을수 있었다. 이러한 박막은 800˚C에서 한 시간 열처리 한 결과, rutile 단일상으로 결정화되었다.

In this study, N doped TiO2 (TiO-N) thin film was prepared by DC magnetron sputtering method to show the photocatalytic activity in a visible range. Various gases (Ar, O2 and N2) were used and Ti target was impressed by 1.2 kW-5.8 kW power range. The hysteresis of TiO-N thin film as a function of discharge voltage wasn't observed in 1.2 and 2.9kW of applied power. Cross sections and surfaces of thin films by FE-SEM were tiny and dense particle sizes of both films with normal cylindrical structures. XRD pattern of TiO2 and TiO-N thin films was appeared by only anatase peak. Red shift in UV-Vis adsorption spectra was investigated TiO-N thin film. Photoactivity was evaluated by removal rate measurement of suncion yellow among reactive dyes. The photodegradation rate of TiO2 thin film on visible radiation was shown little efficiency but TiO-N was about 18%.