As the limitations of Moore’s Law become evident, there has been growing interest in advanced packaging technologies. Among various 3D packaging techniques, Cu-SiO2 hybrid bonding has gained attention in heterogeneous devices. However, certain issues, such as its high-temperature processing conditions and copper oxidation, can affect electrical properties and mechanical reliability. Therefore, we studied depositing only a heterometal on top of the Cu in Cu-SiO2 composite substrates to prevent copper surface oxidation and to lower bonding process temperature. The heterometal needs to be deposited as an ultra-thin layer of less than 10 nm, for copper diffusion. We established the process conditions for depositing a Co film using a Co(EtCp)2 precursor and utilizing plasma-enhanced atomic layer deposition (PEALD), which allows for precise atomic level thickness control. In addition, we attempted to use a growth inhibitor by growing a self-assembled monolayer (SAM) material, octadecyltrichlorosilane (ODTS), on a SiO2 substrate to selectively suppress the growth of Co film. We compared the growth behavior of the Co film under various PEALD process conditions and examined their selectivity based on the ODTS growth time.

Thin films of yttria-stabilized zirconia (YSZ) nanoparticles were prepared using a low-temperature deposition and crystallization process involving successive ionic layer adsorption and reaction (SILAR) or SILAR-Air spray Plus (SILAR-A+) methods, coupled with hydrothermal (175 °C) and furnace (500 °C) post-annealing. The annealed YSZ films resulted in crystalline products, and their phases of monoclinic, tetragonal, and cubic were categorized through X-ray diffraction analysis. The morphologies of the as-prepared films, fabricated by SILAR and SILAR-A+ processes, including hydrothermal dehydration and annealing, were characterized by the degree of surface cracking using scanning electron microscopy images. Additionally, the thicknesses of the YSZ thin films were compared by removing diffusion layers such as spectator anions and water accumulated during the air spray plus process. Crack-free YSZ thin films were successfully fabricated on glass substrates using the SILAR-A+ method, followed by hydrothermal and furnace annealing, making them suitable for application in solid oxide fuel cells.

Large-area graphene of the order of centimeters was deposited on copper substrates by low-pressure chemical vapor deposition (LPCVD) using hexane as the carbon source. The effect of temperature and the carrier gas flowrates on the quality and uniformity of the as-deposited graphene was investigated using the Raman analysis. The film deposited at 870 °C with a total carrier gas flowrate of 50 sccm is predominantly single-layer with very low defects according to the Raman spectra. The 2D/G peak intensity ratios obtained from the Raman spectra of samples from three different locations of graphene deposited on a whole copper catalyst was used to calculate the large-area uniformity. Based on the results, a very high uniformity of 89.6% was calculated for the graphene deposited at 870 °C. The uniformity was observed to decrease with increasing temperature. Similar to the thickness uniformity, the electrical conductivity values obtained as a result of I–V measurements and water contact angle measurements were found to be close to each other for the graphene deposited under the same deposition conditions.

Dry etching of copper thin films is performed using high density plasma of ethylenediamine (EDA)/ hexafluoroisopropanol (HFIP)/Ar gas mixture. The etch rates, etch selectivities and etch profiles of the copper thin films are improved by adding HFIP to EDA/Ar gas. As the EDA/HFIP concentration in EDA/HFIP/Ar increases, the etch rate of copper thin films decreases, whereas the etch profile is improved. In the EDA/HFIP/Ar gas mixture, the optimal ratio of EDA to HFIP is investigated. In addition, the etch parameters including ICP source power, dc-bias voltage, process pressure are varied to examine the etch characteristics. Optical emission spectroscopy results show that among all species, [CH], [CN] and [H] are the main species in the EDA/HFIP/Ar plasma. The X-ray photoelectron spectroscopy results indicate the formation of CuCN compound and C-N-H-containing polymers during the etching process, leading to a good etch profile. Finally, anisotropic etch profiles of the copper thin films patterned with 150 nm scale are obtained in EDA/HFIP/Ar gas mixture.

In order to observe the microstructure and morphology of porous titanium -oxide thin film, deposition is performed under a higher Ar gas pressure than is used in the general titanium thin film production method. Black titanium thin film is deposited on stainless steel wire and Cu thin plate at a pressure of about 12 Pa, but lustrous thin film is deposited at lower pressure. The black titanium thin film has a larger apparent thickness than that of the glossy thin film. As a result of scanning electron microscope observation, it is seen that the black thin film has an extremely porous structure and consists of a separated column with periodic step differences on the sides. In this configuration, due to the shadowing effect, the nuclei formed on the substrate periodically grow to form a step. The surface area of the black thin film on the Cu thin plate changes with the bias potential. It has been found that the bias of the small negative is effective in increasing the surface area of the black titanium thin film. These results suggest that porous titanium-oxide thin film can be fabricated by applying the appropriate oxidation process to black titanium thin film composed of separated columns.

식품의 생물학적 위해요소인 해충과 유해균 및 부패균을 제어하기 위해 실제 포장필름 생산 공정 설비를 이용하여 방충 및 항균 기능성을 갖는 식품용 다층 포장필름을 제조하였다. 우선, 효과적인 활성 물질의 스크리닝 과정을 통해 식품의 대표적 해충인 화랑곡나방 유충(Plodia interpunctella)에 대해 기피력을 나타내는 팔각회향 에센셜 오일과, 황색포도상구균(Staphylococcus aureus) 및 페니실리움(Penicillium roqueforti)에 대해 항균력을 갖는 티몰(thymol)을 필름내 혼입할 활성 물질로 선정하였다. 선정된 활성 물질을 혼입한 폴리우레탄계 코팅액을 polyethylene terephthalate (PET) 12 μm 필름 표면에 코팅하였으며, 방충용 필름은 polypropylene (PP) 30 μm을, 항균용 필름은 low-density polyethylene (LDPE) 30 μm을 적층하여 다층필름의 구조로 제조하였다. Large-scale 생산 공정 설비를 통해 제조된 필름을 활용하여 유충에 대한 기피 효과와 항균력을 측정하였으며, 대조군 필름은 유충에 대한 기피력 및 항균 효과를 보이지 않은 반면, 개발된 방충 및 항균 필름은 화랑곡나방 유충과 두 가지 균에 대해 각각 뛰어난 기피력과 항균 효과를 보였다. 따라서, 본 연구는 식품 포장소재의 대량생산에 활용 가능한 표면 코팅 기술을 개발하고 그 방충효과 및 항균 효과를 입증함으로써 식품 중 생물학적 위해요소의 저감화를 위한 식품 포장 신소재 개발에 기여할 것이다.

Edible biopolymer films were developed from the exopolysaccharides (EPS) extracted from Weissella confusa 113-2. The optimum composition for film formation was determined using the response surface analysis with the explanatory variables of the EPS (0.5-5.5%) and glycerol (0.5-5.5%) concentrations and the response variable of film elastic modulus (EM). The mass ratio of distilled water to solids was set constant (14:1). Tensile strength (TS), percentage elongation at break (%E), EM, water vapor permeability (WVP) of EPS films were evaluated. The glass transition temperatures of the films were also determined by a dynamic mechanical analysis. The optimum mass ratio of EPS to glycerol was 0.754:0.375. The WVP, TS, %E, and EM of the film under the optimal composition were 3.53±0.21 g·mm/kPa·h·m2, 7.03±0.49 MPa, 84.82±12.31%, and 62.03±6.93 MPa, respectively. The glass transition temperature varied from 54 to 83 °C. The EPS film has the potential to be applied to food products as an edible film with physical and barrier properties comparable to other biopolymer edible films.

식품 포장재 내 곤충 침입을 방지하기 위해 방향유를 함유한 방충 필름이 연구되고 있으나 파일럿 규모의 생산 장비를 이용한 연구는 드물다. 따라서 본 연구의 목적은 파일럿 규모의 생산 장비로 미세캡슐화된 시나몬방향유(cinnamon oil, CO) 함유 식품 포장 필름을 개발하고 필름의 방충효과와 이화학적 특성을 평가하는 것이었다. 모든 필름은 파일럿 규모의 그라비아 인쇄기(Roto Gravure Printing Press, Ilsung Machinary Co., Ltd., Gumi, Korea)와 적층기(Dry laminating & Extrusion laminating machine, INT CO., Ltd; Ansan, Korea)로 제작되었다. 폴리비닐알코올 수용액(0.02%, w/w, 폴리비닐알코올/증류수)을 사용하여 CO (5.2%, w/w, CO/PVA 수용액) 미세캡슐 에멀션을 제조하였고, 0,1 또는 2% (w/w, CO/미세캡슐 CO 에멀션)의 미세캡슐 CO 에멀션을 잉크(54 또는 61%, w/w, 잉크/전체 혼합액)와 시너(thinner) (23 또는 26%, w/w, 시너/전체 혼합액)에 혼합하여 인쇄 용액을 만들었다. 만들어진 용액을 폴리프로필렌필름(30 μm)에 그라비아 인쇄기로 인쇄한 후, 인쇄된 면에 저밀도폴리에틸렌 필름(40 μm)을 올려놓고 적층(lamination)하여 방충 필름(75 μm 두께)을 제작하였다. 소규모와 파일럿 규모로 진행된 필름의 방충효과 측정에는 화랑곡 나방(Plodia interpunctella) 유충을 사용하였고, 개발된 필름의 시남알데하이드 방출률, 인장 및 수분 차단 특성 그리고 열 중량을 분석하였다. 파일럿 규모 인쇄기와 적층기는 미세캡슐 CO 에멀션이 사용된 방출필름을 연속적이고 균일하게 생산하였다. 미세캡슐 2% CO 에멀션 제형으로 제작된 필름이 가장 높은 방충능을 보였으며, 미세캡슐화가 방충효과를 유지하면서 시남알데하이드의 보존성을 높여 방충효과를 유지하는 데 효과적임을 알 수 있었다. 열 중량분석 결과를 통해 미세캡슐화와 적층이 CO의 휘발을 막는 데 효과적임을 확인했다. 필름의 인장강도, 신장률, 탄성률 그리고 수증기 투과성은 각각 40.4-45.4 MPa, 87.1-87.6%, 831.8-838.1 MPa, 그리고 0.0078-0.0082 g·mm·h-1·kPa-1·m-2이 었으며, 이 결과들은 개발된 방충 필름의 인장 및 수분특성에 변화를 주지 않는 것으로 관찰되었다(p>0.05). 연구를 통해 파일럿 플랜트 규모에서 방충 필름을 성공적으로 제작할 수 있었고, 방충효과와 이화학적 특성 결과를 통해 제작된 방충 필름의 상업적 적용 가능성을 확인할 수 있었다.

In this study, we report a general method for preparation of a one-dimensional (1D) arrangement of Au nanoparticles on single-walled carbon nanotubes (SWNTs) using biologically programmed peptides as structure-guiding 1D templates. The peptides were designed by the combination of glutamic acid (E), glycine (G), and phenylalanine (F) amino acids; peptides efficiently debundled and exfoliated the SWNTs for stability of the dispersion and guided the growth of the array of Au nanoparticles in a controllable manner. Moreover, we demonstrated the superior ability of 1D nanohybrids as flexible, transparent, and conducting materials. The highly stable dispersion of 1D nanohybrids in aqueous solution enabled the fabrication of flexible, transparent, and conductive nanohybrid films using vacuum filtration, resulting in good optical and electrical properties.

Aluminum oxide (Al2O3) thin films were grown by atomic layer deposition (ALD) using a new Al metalorganic precursor, dimethyl aluminum sec-butoxide (C12H30Al2O2), and water vapor (H2O) as the reactant at deposition temperatures ranging from 150 to 300 oC. The ALD process showed typical self-limited film growth with precursor and reactant pulsing time at 250 oC; the growth rate was 0.095 nm/cycle, with no incubation cycle. This is relatively lower and more controllable than the growth rate in the typical ALD-Al2O3 process, which uses trimethyl aluminum (TMA) and shows a growth rate of 0.11 nm/ cycle. The as-deposited ALD-Al2O3 film was amorphous; X-ray diffraction and transmission electron microscopy confirmed that its amorphous state was maintained even after annealing at 1000 oC. The refractive index of the ALD-Al2O3 films ranged from 1.45 to 1.67; these values were dependent on the deposition temperature. X-ray photoelectron spectroscopy showed that the ALD-Al2O3 films deposited at 250oC were stoichiometric, with no carbon impurity. The step coverage of the ALD-Al2O3 film was perfect, at approximately 100%, at the dual trench structure, with an aspect ratio of approximately 6.3 (top opening size of 40 nm). With capacitance-voltage measurements of the Al/ALD-Al2O3/p-Si structure, the dielectric constant of the ALDAl2O3 films deposited at 250 oC was determined to be ~8.1, with a leakage current density on the order of 10−8 A/cm2 at 1 V.

본 연구의 목적은 광전환재의 사이즈가 다른 광전환 필름을 피복한 온실에서, 실내 생육 환경, 토마토 및 상추의 생육과 품질을 분석하는 것이다. 10μm 이상의 광 전환재를 이용한 광전환 필름(Micro 필름), 500nm 이하의 광전환재를 이용한 광전환 필름(Nano 필름)과 폴리에틸렌(PE) 필름을 2중 온실의 외피복재로 피복하였다. 내피복재는 0.06mm PE 필름을 사용하였고, 내피복 재 및 외피복재의 두께는 모두 0.06mm로 동일하였다. 광전환 필름의 인장강도, 인열강도, 신장율은 PE 필름과 유사하였다. 투광률은 Nano 필름이 600-750nm 및 전체 투광률에서 PE 필름보다 높았으며, Micro 필름은 PE 필름보다 전체 투광률이 낮았다. 온실 내 기온은 Micro 및 Nano 필름 온실이 PE 필름 온실에 비하여 약 2oC정도 높았고, 광전환 필름 온실 간의 유의적인 차이는 없었다. 지온은 Nano 필름 온실이 Micro 필름과 PE 온실에 비하여 각각 1.5, 3 정도 높았다. 토마토의 수량은 PE 필름 온실에 비해 Micro 및 Nano 필름 온실에서 각각 12%, 14% 정도 유의적으로 증가하였고, 당도 차이는 없었다. 그리고 광전환 필름 간의 유의적인 차이는 없었다. 상추의 수량은 Micro 필름 온실이 Nano 필름 및 PE 필름 온실에 비하여 각각 27%, 59% 높았다. Hunter의 적색 값a는 Nano 필름 온실에서 가장 높았다. 토마토와 같이 높은 광을 요구하는 작물은 투광률이 좋은 Nano 필름이 적합하였고, 상추와 같이 낮은 광을 요구하는 작물은 상추는 Micro 필름이 적합하다고 판단되었다.

이 연구는 대학에서 ‘음악의 이해’, 혹은 ‘서양음악의 이해’ 등의 명칭으로 개설된 교양과목으 로서의 ‘음악’에 관한 영화를 활용한 교수법을 다룬 것이다. 이 연구에서 칭하는 ‘대학교양음악’이란 인류문화와 함께 성장해 온 음악의 저변에 대한 고찰을 다루는 ‘음악 입문과목’으로서, 서양음악에 관한 역사, 감상, 이론 등이 유기적으로 어우러져 포괄적이고 통합적인 접근으로 교양교육이 이루어 져야 함을 상징한다. 이에 본 연구는 ‘교양교육으로의 음악’이라는 거시 목표 아래, 그 첫 걸음을 ‘영화’의 활용에서 찾고 있다. ‘영화 속 클래식’이라는 학습동기의 제공은 자칫 고루할 수 있는 클래식 음악에 대한 집 중도를 잃지 않게 하면서 교수자가 원하는 학습목표로의 도달을 용이하게 한다. 바로 이러한 점이 학습자들에게 클래식 음악으로 자연스럽게 입문하는 계기를 제공해 줄 수 있는 것이며, 궁극의 목표 인 음악을 폭넓게 즐기는 방법, 즉, 교양으로서의 음악교육에 도움이 될 방법을 찾아가는 길인 것이 다. 그러므로, 본 연구에서는 영화 《캐논 인버스》를 대상으로, 영화구도와 삽입된 클래식들의 음 악 교육적 관점 분석에 근거한 실제 강의 모형을 구축하였다. 이러한 ‘대학교양음악’의 구상을 통한 학습목표의 성취가 일차적으로는 합리적인 ‘대학교양음악’을 이끌 것이며, 나아가 대학의 효과적인 교양교육으로 이어질 뿐 아니라, 장기적 안목에서 국가와 사회가 지향하는 교양교육으로서의 이상을 실현하게 되는 하나의 대안이 될 것이다.

Sb-doped SnO2(ATO) thin films were prepared using electrospinning. To investigate the optimum properties of the electrospun ATO thin films, the deposition numbers of the ATO nanofibers(NFs) were controlled to levels of 1, 2, 4, and 6. Together with the different levels of deposition number, the structural, chemical, morphological, electrical, and optical properties of the nanofibers were investigated. As the deposition number of the ATO NFs increased, the thickness of the ATO thin films increased and the film surfaces were gradually densified, which affected the electrical properties of the ATO thin films. 6 levels of the ATO thin film exhibited superior electrical properties due to the improved carrier concentration and Hall mobility resulting from the increased thickness and surface densification. Also, the thickness of the samples had an effect on the optical properties of the ATO thin films. The ATO thin films with 6 deposited levels displayed the lowest transmittance and highest haze. Therefore, the figure of merit(FOM) considering the electrical and optical properties showed the best value for ATO thin films with 4 deposited levels.

Aluminum nitride, a compound semiconductor, has a Wurtzite structure; good material properties such as high thermal conductivity, great electric conductivity, high dielectric breakdown strength, a wide energy band gap (6.2eV), a fast elastic wave speed; and excellent in thermal and chemical stability. Furthermore, the thermal expansion coefficient of the aluminum nitride is similar to those of Si and GaAs. Due to these characteristics, aluminum nitride can be applied to electric packaging components, dielectric materials, SAW (surface acoustic wave) devices, and photoelectric devices. In this study, we surveyed the crystallization and preferred orientation of AlN thin films with an X-ray diffractometer. To fabricate the AlN thin film, we used the magnetron sputtering method with N2, NH3 and Ar. According to an increase in the partial pressures of N2 and NH3, Al was nitrified and deposited onto a substrate in a molecular form. When AlN was fabricated with N2, it showed a c-axis orientation and tended toward a high orientation with an increase in the temperature. On the other hand, when AlN was fabricated with NH3, it showed a-axis orientation. This result is coincident with the proposed mechanism. We fabricated AlN thin films with an a-axis orientation by controlling the sputtering electric power, NH3 pressure, deposition speed, and substrate temperature. According to the proposed mechanism, we also fabricated AlN thin films which demonstrated high aaxis and c-axis orientations.

To observe the formation of defects at the interface between an oxide semiconductor and SiO2, ZnO was preparedon SiO2 with various oxygen gas flow rates by RF magnetron sputtering deposition. The crystallinity of ZnO depends on thecharacteristic of the surface of the substrate. The crystallinity of ZnO on a Si wafer increased due to the activation of ionicinteractions after an annealing process, whereas that of ZnO on SiO2 changed due to the various types of defects which hadformed as a result of the deposition conditions and the annealing process. To observe the chemical shift to understand of defectdeformations at the interface between the ZnO and SiO2, the O 1s electron spectra were convoluted into three sub-peaks bya Gaussian fitting. The O 1s electron spectra consisted of three peaks as metal oxygen (at 530.5eV), O2− ions in an oxygen-deficient region (at 531.66eV) and OH bonding (at 532.5eV). In view of the crystallinity from the peak (103) in the XRDpattern, the metal oxygen increased with a decrease in the crystallinity. However, the low FWHM (full width at half maximum)at the (103) plane caused by the high crystallinity depended on the increment of the oxygen vacancies at 531.66eV due tothe generation of O2− ions in the oxygen-deficient region formed by thermal activation energy.

We report a highly sensitive NO2 gas sensor based on multi-layer graphene (MLG) films synthesized by a chemical vapor deposition method on a microheater-embedded flexible substrate. The MLG could detect low-concentration NO2 even at sub-ppm (<200 ppb) levels. It also exhibited a high resistance change of ~6% when it was exposed to 1 ppm NO2 gas at room temperature for 1 min. The exceptionally high sensitivity could be attributed to the large number of NO2 molecule adsorption sites on the MLG due to its a large surface area and various defect-sites, and to the high mobility of carriers transferred between the MLG films and the adsorbed gas molecules. Although desorption of the NO2 molecules was slow, it could be enhanced by an additional annealing process using an embedded Au microheater. The outstanding mechanical flexibility of the graphene film ensures the stable sensing response of the device under extreme bending stress. Our large-scale and easily reproducible MLG films can provide a proof-of-concept for future flexible NO2 gas sensor devices.

원자전달 라디칼 중합(ATRP)에 의해 poly(vinyl chloride) (PVC) 주사슬과 poly(styrene sulfonic acid) (PSSA) 곁사슬로 되어있는 양쪽성 PVC-g-PSSA 가지형 공중합체를 합성하였다. PVC-g-PSSA 가지형 공중합체 고분자를 템플레이트로 사용하고 졸겔법을 적용하여, 결정성 아타네제상의 미세기공 이산화티타튬 필름을 제조하였다. TiO2 전구체인 TTIP를 친수성인 PSSA 영역과 선택적으로 작용시켜 TiO2 메조기공 필름을 성장하였으며, 이를 주사전자 현미경 (SEM)과 엑스레이회절 (XRD)분석을 통해 분석하였다. 스핀코팅 횟수와 P25 도입에 따른 염료감응 태양전지 성능을 체계적으로 분석하였다. 그 결과 준고체 고분자 전해질을 이용하였을 때, 100 mW/㎠ 조건에서 에너지 변환 효율이 2.7%에 이르렀다.