‘조성’은 국내에서 답리작 재배가 가능한 조숙성 트리티케일 품종 개발을 목표로 2010년에농촌진흥청 국립식량과학원에서 육성되었다. 계통은 1992년에 국제밀 옥수수연구소(CIMMYT)에서 FAHAD_5와 RHINO1R.1D 5+10 5D'5B'의잡종에 FAHAD_5를 여교잡하여 작성되었으며,선발된 고세대 계통인 ‘CTSS92Y-A-4Y-0M-5Y0B’에 대해 2006년부터 2007년까지 2년간 생산력 검정시험을 실시하였다. 이 계통은 숙기가빠르고 건물수량이 많아 ‘익산26호’로 계통명을 부여하고 2008년부터 2010년까지 3년간에걸쳐 제주 익산 청원 예산 나주 대구 및진주 등 7개 지역에서 지역적응시험을 실시하여 2010년 11월 신품종으로 선정되었으며, 그특성은 다음과 같다. 트리티케일 신품종 ‘조성’은 농록색 잎, 황색 줄기, 황갈색의 큰 종실을가졌다. 출수기가 전국 평균 4월 24일로 표준품종인 ‘신영’보다 5일, 제주지역에서는 10일빨랐다. ‘조성’의 한해는 ‘신영’과 대등하였고,도복에 강하였으며, 습해 흰가루병 및 잎녹병등에 저항성이었다. 건물수량은 ha당 평균 14.5톤으로 16.5톤인 ‘신영’에 비해 12% 낮았다.‘조성’은 ‘신영’에 비해 조단백질 함량이 5.3%로 다소 낮았으나 NDF 및 ADF 함량(%)이 낮아 TDN 함량(%)이 64.0%로 ‘신영’에 비해2.1% 높았다. ‘조성’은 ‘신영’에 비해 천립중이46.6g, 중이 692g으로 무겁고, 종실수량이 ha당 5.1톤으로 ‘신영’보다 40% 많았다. 적응지역은 1월 최저평균기온이 10 이상인 지역이면 전국 어느 곳에서나 재배가 가능하며, 특히벼 이앙이 빨라 월동작물의 재배가 곤란한 지역에서도 답리작 재배를 통한 조사료 생산이가능하다.

본 연구는 간척지에서 재배가 가능한 내염성 보리 품종육성을 위한 기초정보를 얻고자 겉보리 두 품종을 대상으로 생육초기 염 스트레스에 따른 생리적 반응과 잎 프로테옴의 발현양상 변화를 분석한 결과는 아래와 같다. 1. 토양의 염 농도가 증가함에 따라 보리의 건물중은 무처리구에 비해 유의적으로 감소하는 경향이었으며, 상록보리는무처리구에 비해 건물중 감소가 작았으며, 선우보리는 컸다. 2. 염처리에 따른 잎의 엽록소 함량을 나타내는 SPAD 값은상록보리가 57.6으로 47.6인 선우보리보다 높았으며, Na+의 함량은 선우보리에서 유의적으로 높았고, K+/Na+의 비율은 상록보리에서 높은 경향을 보였다. 3. 이차원전기영동에 의하여 염 스트레스에 의한 잎 프로테옴의 발현양상을 분석한 결과 47개 단백질 spot이 발현양의차이를 나타냈다. 품종별로 발현양이 증가한 단백질 spot은 상록보리와 선우보리에서 각각 17개와 14개로 나타났고, 발현양이 감소한 단백질 spot은 상록보리와 선우보리에서 각각 28개및 27개로 확인되었다. 4. 염처리에 따른 발현양의 차이를 보이는 18개 단백질을 동정한 결과 ribosomal protein 등 기능과 스트레스와의 관련성이 보고된 10개의 단백질과 ankyrin repeat domain protein등 스트레스 조건에서의 역할이 명확하지 않은 4개의 단백질및 Os02g0753300 등 기능 및 스트레스와의 관련성을 알 수없는 2개의 단백질이 동정되었다.

There have been many efforts to modify and improve the properties of functional thin films by hybridization with nano-sized materials. For the fabrication of electronic circuits, micro-patterning is a commonly used process. For photochemical metal-organic deposition, photoresist and dry etching are not necessary for microscale patterning. We obtained direct-patternable SnO2 thin films using a photosensitive solution containing Ag nanoparticles and/or multi-wall carbon nanotubes (MWNTs). The optical transmittance of direct-patternable SnO2 thin films decreased with introduction of nanomaterials due to optical absorption and optical scattering by Ag nanoparticles and MWNTs, respectively. The crystallinity of the SnO2 thin films was not much affected by an incorporation of Ag nanoparticles and MWNTs. In the case of mixed incorporation with Ag nanoparticles and MWNTs, the sheet resistance of SnO2 thin films decreased relative to incorporation of either single component. Valence band spectral analyses of the nano-hybridized SnO2 thin films showed a relation between band structural change and electrical resistance. Direct-patterning of SnO2 hybrid films with a line-width of 30 μm was successfully performed without photoresist or dry etching. These results suggest that a micro-patterned system can be simply fabricated, and the electrical properties of SnO2 films can be improved by incorporating Ag nanoparticles and MWNTs.

This study shows the effects of deionized (DI) rinse and oxide HF wet etch processes on silicon substrate during a photolithography process. We found a fail at the wafer center after DI rinse step, called Si pits, during the fabrication of a complementary metal-oxide-semiconductor (CMOS) device. We tried to find out the mechanism of the Si pits by using the silicon wafer on CMOS fabrication and analyzing the effects of the friction charge induced by the DI rinsing. The key parameters of this experiment were revolution per minute (rpm) and time. An incubation time of above 10 sec was observed for the formation of Si pits and the rinsing time was more effective than rpm on the formation of the Si pits. The formation mechanism of the Si pits and optimized rinsing process parameters were investigated by measuring the charging level using a plasma density monitor. The DI rinse could affect the oxide substrate by a friction charging phenomenon on the photolithography process. Si pits were found to be formed on the micro structural defective site on the Si substrate under acceleration by developed and accumulated charges during DI rinsing. The optimum process conditions of DI rinse time and rpm could be established through a systematic study of various rinsing conditions.

Benzotriazole (B.T.A) which has been mainly used for the stabilization processing method of excavated copper and bronze artifacts is vaporized within 2~3 years after the usage because it is unstable at the acid conditions and cannot protect the surface of artifacts. In this study, NaOH method which has been used for the steel artifacts was applied as a stabilization process for the method of copper and bronze artifacts to gush chlorine ion out. For the reproduction of excavated samples, copper and bronze plates were dipped in 0.1M HCl for 26 hrs to form CuCl, rusted at 70˚C with RH 75% for the formation of corrosion products, and desalted in 0.1 M NaOH solution. The concentration of chlorine ion was measured by using ionchromatography. During the desalting process, a large quantity of chlorine ions was gushed out in early period and corrosion products were not additionally generated through the re-corrosion experiment. This NaOH desalting process was found to be a method of stabilization process for copper and bronze artifacts from the formation of Tenorite (CuO) during desalting as a protection layer for corrosion.

The electrochromic properties of Au nanoparticles (NPs) incorporating poly (3, 4-ethylenedioxythiphene) (PEDOT) film were investigated. Trisodium citrate was used for stabilizing Au NPs to control the size. The capping molecules of the Au nanoparticles were exchanged from citrate to 2-mercaptoethanol (2-ME). Water was removed by centrifuge and Au NPs were redispersed in methanol (MeOH). Finally, we obtained ca. 11.7 nm diameter of Au NPs. The effects of 0.15 at% of Au NPs incorporation on the optical, electrical, and eletrochromic properties of PEDOT films were investigated. The electrical property and switching speed of Au/PEDOT film was slightly improved over that of PEDOT film because Au NPs play a hopping site role and affect packing density of the PEDOT chain. Through the ultra violet-visible spectra of PEDOT and Au/PEDOT films at -0.7 V (vs Ag/AgCl), blue shift of maximum absorption peak was observed from PEDOT (585.4 nm) to Au/PEDOT (572.2 nm) due to a shortening of conjugated length of PEDOT. The Au NPs interfered with the degree of conjugation and the maximum absorption peak was shifted to shorter wavelength.

The ferroelectric properties of UV irradiated and non-irradiated PZT films prepared via photochemical metal-organic deposition using photosensitive precursors were characterized. Fourier transform infrared spectroscopy showed that complete removal of organic groups was possible through UV exposure of the spin-coated PZT precursor films at room temperature. The measured remnant polarization values of UV-irradiated and non-irradiated PZT films after annealing at 650˚C were 29 and 23 μC/cm2, respectively. The UV irradiation was found to be effective for the enhancement of the<111> growth orientation and ferroelectric property of PZT film and in the direct patterning in the fabrication of micro-patterned systems without dry etching.

A process known as the MR and EMR combination process is able to overcome the shortcomings of the MR (metallothermic reduction) and EMR (electronically mediated reaction) process. The effects of as the raw material, sodium as the reducing agent and KCl/KF as the diluent on the characteristics of tantalum powder are investigated. In this study, a MR-EMR combination process has been employed to tantalum powder on the location of reductant. The excess of reductant were varied from 25, 50 to 75 wt%. The total charge and external circuit decreases as the amount of reductant increases. The average particle size increases with increasing the amount of reductant.

In the metallothermic reduction (MR) process used to obtain tantalum powder in one batch, it is difficult to control the morphology and location of the tantalum deposits. On the other hand, an electronically mediated reaction (EMR) process is capable of overcoming this difficulty. The effect of using as the raw material and sodium as the reducting agent on the characteristics of tantalum powder are investigated. As the temperature of the reduction varied from 1023K to 1223K, the powder particles obtained with MR were relatively large , while those prepared via EMR were of uniform . In the MR process, the Ta powder recovery rate increased from 37% to 83% at 1123K in constrat with EMR process.

In this study, tantalum powder has been producted by MR-EMR combination process. MR-EMR combination process is a method that is able to improve demerits of MR(metallothermic reduction) and EMR(electronically mediated reaction) process. This study examined the characteristics of powder with the amount of reductant excess using TaF as feed materials, Na as a reductant and KCl/KF as a diluent. In addition, this study examined acid treatment that affect the high purification of powder. The impurities contained in powder was removed in various conditions of acid treatment. The total charge passed through external circuit and average particle size(FSSS) were increased with increasing amount of sodium excess. The proportion of fine particle(-325mesh) was decreased with increasing amount of sodium excess. The yield was improved from 70％ to 76% with increasing amount of sodium excess. Considering the impurities, charge, morphology, particle size and yield, an amount of sodium excess of 10wt% were found to be optimum conditions for MR-EMR combination process.s.