In this experimental work, a p-type c-Si (100) substrate with 8 × 8 × 2 mm dimension was taken for TiCN thin-film coating deposition. The whole deposition process was carried out by chemical vapor deposition (CVD) process. The Si substrate was placed within the CVD chamber at base pressure and process pressure of 0.75 and 500 mTorr, respectively, in the presence of TiO2 (99.99% pure) and C (99.99% pure) powder mixture. Later on, quantity of C powder was varied for different set experiments. The deposition of TiCN coating was carried out in the presence of N2– H2–TiCl4–CH3CN gas mixture and 600 ℃ of fixed temperature. The time for deposition was fixed for 90 min with 10 and 5 ℃ min− 1 heating and cooling rate, respectively. Later on, heat treatment process was carried out over these deposited TiCN samples to investigate the changing characteristics. The heat treatment was carried out at 800 ℃ within the CVD chamber in the absence of any gas flow rate. The morphological properties of heat-treated samples have been improved significantly, evidence is observed from SEM and AFM analyses. The structural analysis by XRD has been suggested, upgradation in crystallinity of the heat-treated film as it possessed with sharp and higher intensity peaks. Evidence has been found that the electrochemical properties are enhanced for heat-treated sample. Raman spectroscopy shows that the intensity of acoustic phonon modes predominates the optic phonon modes for untreated samples, whereas for heat-treated samples, opposite trends have been observed. However, significant degradation in mechanical properties for heat-treated sample has been observed compared to untreated sample.

AZO/Cu/AZO thin films were deposited on glass by RF magnetron sputtering. The specimens showed the preferred orientation of (0002) AZO and (111) Cu. The Cu crystal sizes increased from about 3.7 nm to about 8.5 nm with increasing Cu thickness, and from about 6.3 nm to about 9.5 nm with increasing heat treatment temperatures. The sizes of AZO crystals were almost independent of the Cu thickness, and increased slightly with heat treatment temperature. The residual stress of AZO after heat treatment also increased compressively from -4.6 GPa to -5.6 GPa with increasing heat treatment temperature. The increase in crystal size resulted from grain growth, and the increase in stress resulted from the decrease in defects that accompanied grain growth, and the thermal stress during cooling from heat treatment temperature to room temperature. From the PL spectra, the decrease in defects during heat treatment resulted in the increased intensity. The electrical resistivities of the 4 nm Cu film were 5.9 × 10-4 Ω ‧ cm and about 1.0 × 10-4 Ω ‧ cm for thicker Cu films. The resistivity decreased as the temperature of heat treatment increased. As the Cu thickness increased, an increase in carrier concentration resulted, as the fraction of AZO/Cu/AZO metal film increased. And the increase in carrier concentration with increasing heat treatment temperature might result from the diffusion of Cu ions into AZO. Transmittance decreased with increasing Cu thicknesses, and reached a maximum near the 500 nm wavelength after being heat treated at 200 °C.

연구에서는 새로 설계한 고분자 절연체 위에 전자 주개(Donor)-받개(Acceptor) 기반의 반도체성 공중합체인 Cyclopentadithiophene-alt-benzothiadiazole (CDT-BTZ)를 활성 반도체층으로 형성하여 제작한 고분자 반도체 전계효과 트랜지스터의 전기적 특성을 살펴보았다. 이 연구에서 제시하는 고분자 절연체 박막은 내열성과 전기절연성이 우수한 포스파젠과 멜리민 구조가 가교된 형태를 가지기 때문에 0.006 nm의 매우 평탄한 RMS 표면 거칠기를 가졌으며, 4.5 MV/cm 이상의 매우 우수한 절연강도와 1.55의 다소 낮은 유전 상수를 가진 것으로 측정되었다. 그리고, 고분자 절연 막과 계면을 이루는 CDT-BTZ D-A 타입 반도체성 공중합체 박막은 2.0 x 10-3 cm2/Vs의 선형영역 이동도와 1.0 x 10-3 cm2/Vs의 포화영역 이동도를 갖는 것으로 측정되었다. 이를 통해, 고분자 절연체 위에 형성된 CDT-BTZ 고분자 반도체 박막은 유연 전자회로의 스위칭 소자로 쓰이기에 충분한 잠재성이 있다고 여겨진다.

Amorphous In-Ga-Zn-O (a-IGZO) thin film transistors, because of their relatively low mobility, have limits in attempts to fulfill high-end specifications for display backplanes. In-Zn-O (IZO) is a promising semiconductor material for high mobility device applications with excellent transparency to visible light region and low temperature process capability. In this paper, the effects of working pressure on the physical and electrical properties of IZO films and thin film transistors are investigated. The working pressure is modulated from 2 mTorr to 5 mTorr, whereas the other process conditions are fixed. As the working pressure increases, the extracted optical band gap of IZO films gradually decreases. Absorption coefficient spectra indicate that subgap states increase at high working pressure. Furthermore, IZO film fabricated at low working pressure shows smoother surface morphology. As a result, IZO thin film transistors with optimum conditions exhibit excellent switching characteristics with high mobility (≥ 30cm2/Vs) and large on/off ratio.

The effects of fast neutron irradiation on the electrical and optical properties of Li (3 at%) doped ZnSnO (ZTO) thin films fabricated using a sol-gel process are investigated. From the results of Li-ZTO TFT characteristics according to change of neutron irradiation time, the saturation mobility is found to increase and threshold voltage values shift to a negative direction from 1,000 s neutron irradiation time. X-ray photoelectron spectroscopy analysis of the O 1s core level shows that the relative area of oxygen vacancies is almost unchanged with different irradiation times. From the results of band alignment, it is confirmed that, due to the increase of electron carrier concentration, the Fermi level (EF) of the sample irradiated for 1,000 s is located at the position closest to the conduction band minimum. The increase in electron concentration is considered by looking at the shallow band edge state under the conduction band edge formed by fast neutron irradiation of more than 1,000 s.

We report on the fabrication and characterization of an oxide photoanode with a zinc oxide (ZnO) nanorod array embedded in cuprous oxide (Cu2O) thin film, namely a ZnO/Cu2O oxide p-n heterostructure photoanode, for enhanced efficiency of visible light driven photoelectrochemical (PEC) water splitting. A vertically oriented n-type ZnO nanorod array is first prepared on an indium-tin-oxide-coated glass substrate via a seed-mediated hydrothermal synthesis method and then a p-type Cu2O thin film is directly electrodeposited onto the vertically oriented ZnO nanorod array to form an oxide p-n heterostructure. The introduction of Cu2O layer produces a noticeable enhancement in the visible light absorption. From the observed PEC current density versus voltage (J-V) behavior under visible light illumination, the photoconversion efficiency of this ZnO/Cu2O p-n heterostructure photoanode is found to reach 0.39 %, which is seven times that of a pristine ZnO nanorod photoanode. In particular, a significant PEC performance is observed even at an applied bias of 0 V vs Hg/Hg2Cl2, which makes the device self-powered. The observed improvement in the PEC performance is attributed to some synergistic effect of the pn bilayer heterostructure on the formation of a built-in potential including the light absorption and separation processes of photoinduced charge carriers, which provides a new avenue for preparing efficient photoanodes for PEC water splitting.

This study examines paraelectric Bi1.5Zn1.0Nb1.5O7 (BZN), which has no hysteresis and high dielectric strength, for energy density capacitor applications. To increase the breakdown dielectric strength of the BZN film further, poly(vinylidene fluoride) BZN-PVDF composite film is fabricated by aerosol deposition. The volume ratio of each composition is calculated using dielectric constant of each composition, and we find that it was 12:88 vol% (BZN:PVDF). To modulate the structure and dielectric properties of the ferroelectric polymer PVDF, the composite film is heat-treated at 200 oC for 5 and 30 minutes following quenching. The amount of α-phase in the PVDF increases with an increasing annealing time, which in turn decreases the dielectric constant and dielectric loss. The breakdown dielectric strength of the BZN film increases by mixing PVDF. However, the breakdown field decreases with an increasing annealing time. The BZN-PVDF composite film has the energy density of 4.9 J/cm3, which is larger than that of the pure BZN film of 3.6 J/cm3.

Membrane fabrication is a critical area that hampers forward osmosis (FO) technology from industrialization. Herein, electrospun poly(vinyl alcohol) (PVA) nanofiber (NF) was used as a support layer for thin film composite (TFC) FO membrane. The PVA NF was incorporated with sulfonated graphene oxide (sGO). The oxygenous-rich sGO enhanced the hydrophilicity and mechanical strength of PVA NF as revealed by contact angle and tensile strength measurements, and pure water flux. On this support, the active polyamide layer was formed through interfacial polymerization. Meanwhile, FO performance of sGO/PVA TFC membrane is currently being evaluated. This work was supported by NRF of Korea funded by the Ministry of Science and ICT (2016R1A2B1009221 and 2017R1A2B2002109) and Ministry of Education (2009-0093816 and 22A20130012051 (BK21Plus)).

We report on the fabrication and photoelectrochemical(PEC) properties of a Cu2O thin film/ZnO nanorod array oxide p-n heterojunction structure with ZnO nanorods embedded in Cu2O thin film as an efficient photoelectrode for solardriven water splitting. A vertically oriented n-type ZnO nanorod array was first prepared on an indium-tin-oxide-coated glass substrate via a seed-mediated hydrothermal synthesis method and then a p-type Cu2O thin film was directly electrodeposited onto the vertically oriented ZnO nanorods array to form an oxide semiconductor heterostructure. The crystalline phases and morphologies of the heterojunction materials were characterized using X-ray diffraction and scanning electron microscopy as well as Raman scattering. The PEC properties of the fabricated Cu2O/ZnO p-n heterojunction photoelectrode were evaluated by photocurrent conversion efficiency measurements under white light illumination. From the observed PEC current density versus voltage (J-V) behavior, the Cu2O/ZnO photoelectrode was found to exhibit a negligible dark current and high photocurrent density, e.g., 0.77 mA/cm2 at 0.5 V vs Hg/HgCl2 in a 1 mM Na2SO4 electrolyte, revealing an effective operation of the oxide heterostructure. In particular, a significant PEC performance was observed even at an applied bias of 0 V vs Hg/ HgCl2, which made the device self-powered. The observed PEC performance was attributed to some synergistic effect of the p-n bilayer heterostructure on the formation of a built-in potential, including the light absorption and separation processes of photoinduced charge carriers.

In this study, we investigated the overpotential of precipitation related to the catalytic activity of electrodes on the initial process of electrodeposition of Co and Co-Ni alloys on polycrystalline Cu substrates. In the case of Co electrodeposition, the surface morphology and the magnetic property change depending on the film thickness, and the relationship with the electrode potential fluctuation was shown. Initially, the deposition potential(−170 mV) of the Cu electrode as a substrate was shown, the electrode potential(Edep) at the Ton of electrodeposition and the deposition potential(−600 mV) of the surface of the electrodeposited Co film after Toff and when the pulse current was completed were shown. No significant change in the electrode potential value was observed when the pulse current was energized. However, in a range of number of pulses up to 5, there was a small fluctuation in the values of Edep and Eimm. In addition, in the Co-Ni alloy electrodeposition, the deposition potential(−280 mV) of the Cu electrode as the substrate exhibited the deposition potential(−615 mV) of the electrodeposited Co-Ni alloy after pulsed current application, the Edep of electrodeposition at the Ton of each pulse and the Eimm at the Toff varied greatly each time the pulse current was applied. From 20 % to less than 90% of the Co content of the thin film was continuously changed, and the value was constant at a pulse number of 100 or more. In any case, it was found that the shape of the substrate had a great influence.

The effects of electron beam(EB) irradiation on the electrical and optical properties of InGaZnO(IGZO) thin films fabricated using a sol-gel process were investigated. As the EB dose increased, the electrical characteristic of the IGZO TFTs changed from semiconductor to conductor, and the threshold voltage values shifted to the negative direction. X-ray photoelectron spectroscopy analysis of the O 1s core level showed that the relative area of oxygen vacancies increased from 14.68 to 19.08 % as the EB dose increased from 0 to 1.5 × 1016 electrons/cm2. In addition, spectroscopic ellipsometer analysis showed that the optical band gap varied from 3.39 to 3.46 eV with increasing EB dose. From the result of band alignment, it was confirmed that the Fermi level(EF) of the sample irradiated with 1.5 × 1016 electrons/cm2 was located at the closest position to the conduction band minimum(CBM) due to the increase of electron carrier concentration

The effect of electron beam (EB) irradiation on the electrical properties of Zn-Sn-O (ZTO) thin films fabricated using a sol-gel process was investigated. As the EB dose increased, the saturation mobility of ZTO thin film transistors (TFTs) was found to slightly decrease, and the subthreshold swing and on/off ratio degenerated. X-ray photoelectron spectroscopy analysis of the O 1s core level showed that the relative area of oxygen vacancies (VO) increased from 10.35 to 12.56 % as the EB dose increased from 0 to 7.5 × 1016 electrons/cm2. Also, spectroscopic ellipsometry analysis showed that the optical band gap varied from 3.53 to 3.96 eV with increasing EB dose. From the results of the electrical property and XPS analyses of the ZTO TFTs, it was found that the electrical characteristic of the ZTO thin films changed from semiconductor to conductor with increasing EB dose. It is thought that the electrical property change is due to the formation of defect sites like oxygen vacancies.

Graphene oxide (GO) has received a lot of attention in membrane science for its CO2-philic nature, which can facilitate CO2 separation performance. In addition, GO has attractive properties for gas separation membrane material due to thin-film membrane formation and tunable transport channel. GO membrane can be generally prepared by coating GO nanosheets on microporous polymer supports for mechanical stability. However, the substrates for in thin GO layer should be carefully chosen for good adhesion between GO layer and support surface with maintaining good separation performance. In this study, we tried to modify the surface properties of high permeable support membranes by using gutter layer as an intermediate layer, and measured the gas transport properties of these GO thin-film composite membranes.

The deposition process for the gap-filling of sub-micrometer trenches using DMDMOS, (CH3)2Si(OCH3)2, and CxHyOz by flowable chemical vapor deposition (F-CVD) is presented. We obtained low-k films that possess superior gap-filling properties on trench patterns without voids or delamination. The newly developed technique for the gap-filling of submicrometer features will have a great impact on IMD and STI for the next generation of microelectronic devices. Moreover, this bottom up gap-fill mode is expected to be universal in other chemical vapor deposition systems.

We developed an Al sputtering process by varying the plasma power, process temperature, and film thickness. We observed an increase of hillock distribution and average diameter with increasing plasma power, process temperature, and film thickness. Since the roughness of a film increases with the increase of the distribution and average size of hillocks, the control of hillock formation is a key factor in the reduction of Al corrosion. We observed the lowest hillock formation at 30 W and 100 oC. This growth characteristic of sputtered Al thin films will be useful for the reduction of Al corrosion in the future of the electronic packaging field.