ITO 투명 전극 필름은 디스플레이, 전기 자동차 등 산업 전 범위에서 널리 사용되는 전자 재료이다. 본 연구에서는 이러한 indium tin oxide (ITO) 필름의 열성형 안정성을 향상시키기 위하여 Poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) 전도성 고분자 코팅 용액 조성을 결정하였다. 1000 S/cm의 고 전도성을 보이는 PEDOT:PSS 용액에 끓는점이 각기 다른 4가지 종류의 용매를 희석하였고, 코팅 전 후 면저항 변화를 분석하였다. 또한 380~800 nm 영역의 광 투과율 분 석 및 Raman 스펙트럼 분석을 통하여 PEDOT:PSS 박막이 코팅된 ITO 투명 전극의 전기적 특성 결정 메커니즘을 규명하였 다. 230°C 열성형 공정 결과 ITO 필름은 113% 연신 상태에서 이미 전기 전도성을 읽었지만, ethylene glycol을 희석 용매로 사용하여 얻어진 전도성 고분자 박막이 적용된 ITO 필름은 126% 고 연신 상태에서도 초기 60 Ω/sq 면저항을 246 Ω/sq로 유지하는 우수한 전기 전도성을 보였다.

Recent advances in technology using ultra-thin noble metal film in oxide/metal/oxide structures have attracted attention because this material is a promising alternative to meet the needs of transparent conduction electrodes (TCE). AZO/ Ag/AZO multilayer films are prepared by magnetron sputtering for Cu2ZnSn(S,Se)4 (CZTSSe) of kesterite solar cells. It is shown that the electrical and optical properties of the AZO/Ag/AZO multilayer films can be improved by the very low resistivity and surface plasmon effects due to the deposition of different thicknesses of Ag layer between oxide layers fixed at AZO 30 nm. The AZO/Ag/AZO multilayer films of Ag 15 nm show high mobility of 26.4 cm2/Vs and low resistivity and sheet resistance of 3.58*10−5 Ωcm and 5.0 Ω/sq. Also, the AZO/Ag (15 nm)/AZO multilayer film shows relatively high transmittance of more than 65% in the visible region. Through this, we fabricated CZTSSe thin film solar cells with 7.51% efficiency by improving the short-circuit current density and fill factor to 27.7 mV/cm2 and 62 %, respectively.

Silver nanowire (AgNW) networks have been adopted as a front electrode in Cu(In,Ga)Se2 (CIGS) thin film solar cells due to their low cost and compatibility with the solution process. When an AgNW network is applied to a CIGS thin film solar cell, reflection loss can increase because the CdS layer, with a relatively high refractive index (n ~ 2.5 at 550 nm), is exposed to air. To resolve the issue, we apply solution-processed ZnO nanorods to the AgNW network as an anti-reflective coating. To obtain high performance of the optical and electrical properties of the ZnO nanorod and AgNW network composite, we optimize the process parameters – the spin coating of AgNWs and the concentration of zinc nitrate and hexamethylene tetramine (HMT – to fabricate ZnO nanorods. We verify that 10 mM of zinc nitrate and HMT show the lowest reflectance and 10% cell efficiency increase when applied to CIGS thin film solar cells.

Transparent conducting electrodes are essential components in various optoelectrical devices. Although indium tin oxide thin films have been widely used for transparent conducting electrodes, silver nanowire network is a promising alternative to indium tin oxide thin films owing to its lower processing cost and greater suitability for flexible device application. In order to widen the application of silver nanowire network, the electrical conductance has to be improved while maintaining high optical transparency. In this study, we report the enhancement of the electrical conductance of silver nanowire network transparent electrodes by copper electrodeposition on the silver nanowire networks. The electrodeposited copper lowered the sheet resistance of the silver nanowire networks from 21.9 Ω/□ to 12.6 Ω/□. We perform detailed X-ray diffraction analysis revealing the effect of the amount of electrodeposited copper-shell on the sheet resistance of the core-shell(silver/copper) nanowire network transparent electrodes. From the relationship between the cross-sectional area of the copper-shell and the sheet resistance of the transparent electrodes, we deduce the electrical resistivity of electrodeposited copper to be approximately 4.5 times that of copper bulk.

Sb-doped SnO2 (ATO) transparent conducting films are fabricated using horizontal ultrasonic spray pyrolysis deposition (HUSPD) to form uniform and compact film structures with homogeneously supplied precursor solution. To optimize the molar concentration and transparent conducting performance of the ATO films using HUSPD, we use precursor solutions of 0.15, 0.20, 0.25, and 0.30 M. As the molar concentration increases, the resultant ATO films exhibit more compact surface structures because of the larger crystallite sizes and higher ATO crystallinity because of the greater thickness from the accelerated growth of ATO. Thus, the ATO films prepared at 0.25 M have the best transparent conducting performance (12.60±0.21 Ω/□ sheet resistance and 80.83% optical transmittance) and the highest figure-of-merit value (9.44±0.17 × 10-3 Ω-1). The improvement in transparent conducting performance is attributed to the enhanced carrier concentration by the improved ATO crystallinity and Hall mobility with the compact surface structure and preferred (211) orientation, ascribed to the accelerated growth of ATO at the optimized molar concentration. Therefore, ATO films fabricated using HUSPD are transparent conducting film candidates for optoelectronic devices.

ZnMgBeGaO/Ag/ZnMgBeGaO multilayer structures were sputter grown and characterized in detail. Results indicated that the electrical properties of the ZnMgBeGaO films were significantly improved by inserting an Ag layer with proper thickness (~ 10 nm). Structures with thicker Ag films showed much lower optical transmission, although the electrical conductivity was further improved. It was also observed that the electrical properties of the multilayer structure were sizably improved by annealing in vacuum (~35% at 300 oC). The optimum ZnMgBeGaO(20nm)/Ag(10nm)/ZnMgBeGaO(20nm) structure exhibited an electrical resistivity of ~2.6 × 10−5 Ωcm (after annealing), energy bandgap of ~3.75 eV, and optical transmittance of 65%~ 95 % over the visible wavelength range, representing a significant improvement in characteristics versus previously reported transparent conductive materials.

A metal mesh TCE film is fabricated using a series of processes such as UV imprinting of a transparent trench pattern (with a width of 2-5 μm) onto a PET film, filling it with silver paste, wiping of the surface, and heatcuring the silver paste. In this work nanosized (40-50 nm) silver particles are synthesized and mixed with submicron (250-300 nm)-sized silver particles to prepare silver paste for the fabrication of metal mesh-type TCE films. The filling of these silver pastes into the patterned trench layer is examined using a specially designed filling machine and the rheological testing of the silver pastes. The wiping of the trench layer surface to remove any residual silver paste or particles is tested with various mixture solvents, and ethyl cellosolve acetate (ECA):DI water = 90:10 wt% is found to give the best result. The silver paste with 40-50 nm Ag:250-300 nm Ag in a 10:90 wt% mixture gives the highest electrical conductance. The metal mesh TCE film obtained with this silver paste in an optimized process exhibits a light transmittance of 90.4% and haze at 1.2%, which is suitable for TSP application.

Transparent conducting electrodes (TCEs) are attracting considerable attention as an important component for emerging optoelectronic applications such as liquid crystal displays, touch panels, and solar cells owing to their attractive combination of low resistivity (< 10-3 Ω cm) and high transparency (>80%) in the visible region. The solutionbased process has unique properties of an easy fabrication procedure, scalability, and low cost compared to the conventional vacuum-based process and may prove to be a useful process for fabricating TCEs for future optoelectronic applications demanding large scale and flexibility. In this paper, we focus on the introduction of a solution-based process for TCEs. In addition, we consider the powder materials used to fabricate solution-based TCEs and strategies to improve their transparent conducting properties.

Transparent conducting oxides (TCOs) were fabricated using solution-based ITO (Sn-doped In2O3) nanoinks with nanorods at an annealing temperature of 200 oC. In order to optimize their transparent conducting performance, ITO nanoinks were composed of ITO nanoparticles alone and the weight ratios of the nanorods to nanoparticles in the ITO nanoinks were adjusted to 0.1, 0.2, and 0.5. As a result, compared to the other TCOs, the ITO TCOs formed by the ITO nanoinks with weight ratio of 0.1 were found to exhibit outstanding transparent conducting performance in terms of sheet resistance (~102.3 Ω/square) and optical transmittance (~80.2%) at 550 nm; these excellent properties are due to the enhanced Hall mobility induced by the interconnection of the composite nanorods with the (440) planes of the short lattice distance in the TCOs, in which the presence of the nanorods can serve as a conducting pathway for electrons. Therefore, this resulting material can be proposed as a potential candidate for solution-based TCOs for use in optoelectronic devices requiring large-scale and low-cost processes.

In this study, we report a general method for preparation of a one-dimensional (1D) arrangement of Au nanoparticles on single-walled carbon nanotubes (SWNTs) using biologically programmed peptides as structure-guiding 1D templates. The peptides were designed by the combination of glutamic acid (E), glycine (G), and phenylalanine (F) amino acids; peptides efficiently debundled and exfoliated the SWNTs for stability of the dispersion and guided the growth of the array of Au nanoparticles in a controllable manner. Moreover, we demonstrated the superior ability of 1D nanohybrids as flexible, transparent, and conducting materials. The highly stable dispersion of 1D nanohybrids in aqueous solution enabled the fabrication of flexible, transparent, and conductive nanohybrid films using vacuum filtration, resulting in good optical and electrical properties.

목 적: 본 연구는 SnO2를 모체로 하는 투명전도성 박막을 제조하기 위하여, 가용성 염인 Sn-Chloride와 H3PO4를 출발물질로 사용하였으며, 졸-겔법으로 박막을 제조하여 특성평가를 연구함이다. 방 법: Spin coating기를 이용하여 코팅용액을 기판에 떨어뜨린 후 공기분위기에서 2000 rpm으로 10초간 기판을 회전하여 박막을 도포하며, 500℃로 10분간 열처리하여 P-doped SnO2 박막을 제조하였다. 결 과: 박막의 표면에는 코팅 횟수가 5회, 10회의 경우에는 기공이나 크랙이 나타나지 않았으나 15회 및 20회로 증가함에 따라 미세한 기공들이 관찰되었다. 가시영역에서의 투과율은 5회 및 10회 코팅한 박막의 경우 약 85~90%을 나타내고 있으나, 코팅횟수가 15회 및 20회로 증가함에 따라 박막의 투과율은 80% 이하로 급격히 감소하였다. 4-probe법을 이용한 전기저항은 박막의 코팅횟수가 10회일 경우에 2.7×10-4Ω·cm-1이었으며, 코팅회수가 15회 및 20회로 증가함에 따라 9.8×10-3Ω?cm-1 및 8.3×10-2Ω·cm-1으로 박막의 저항값은 급격히 증가하였다. 결 론: 10회 코팅한 박막의 가시영역에서의 투과율은 85~90%로 매우 높았으며, 저항 값은 2.7×10-4Ω?cm-1로 투명 전도막으로 사용하기에 충분한 특성을 나타냈다.

Flexible transparent conducting films (TCFs) were fabricated by dip-coating single-wall carbon nanotubes (SWCNTs) onto a flexible polyethylene terephthalate (PET) film. The amount of coated SWCNTs was controlled simply by dipping number. Because the performance of SWCNT-based TCFs is influenced by both electrical conductance and optical transmittance, we evaluated the film performance by introducing a film property factor using both the number of interconnected SWCNT bundles at intersection points, and the coverage of SWCNTs on the PET substrate, in field emission scanning electron microscopic images. The microscopic film property factor was in an excellent agreement with the macroscopic one determined from electrical conductance and optical transmittance measurements, especially for a small number of dippings. Therefore, the most crucial factor governing the performance of the SWCNT-based TCFs is a SWCNT-network structure with a large number of intersection points for a minimum amount of deposited SWCNTs.

Transparent and conducting thin films of Ta-doped SnO2 were fabricated on a glass substrate by a pulse laserdeposition(PLD) method. The structural, optical, and electrical properties of these films were investigated as a function ofdoping level, oxygen partial pressure, substrate temperature, and film thickness. XRD results revealed that all the deposited filmswere polycrystalline and the intensity of the (211) plane of SnO2 decreased with an increase of Ta content. However, theorientation of the films changed from (211) to (110) with an increase in oxygen partial pressure (40 to 100mTorr) and substratetemperature. The crystallinity of the films also increased with the substrate temperature. The electrical resistivity measurementsshowed that the resistivity of the films decreased with an increase in Ta doping, which exhibited the lowest resistivity(ρ~1.1×10−3Ω·cm) for 10wt% Ta-doped SnO2 film, and then increased further. However, the resistivity continuouslydecreased with the oxygen partial pressure and substrate temperature. The optical bandgap of the 10wt% Ta-doped SnO2 filmincreased (3.67 to 3.78eV) with an increase in film thickness from 100-700nm, and the figure of merit revealed an increasingtrend with the film thickness.

ZnO thin films co-doped with Mg and Ga (MxGyZzO, x+y+z=1, x=0.05, y=0.02 and z=0.93) were preparedon glass substrates by RF magnetron sputtering with different sputtering powers ranging from 100W to 200W at a substratetemperature of 350oC. The effects of the sputtering power on the structural, morphological, electrical, and optical propertiesof MGZO thin films were investigated. The X-ray diffraction patterns showed that all the MGZO thin films were grown asa hexagonal wurtzite phase with the preferred orientation on the c-axis without secondary phases such as MgO, Ga2O3, orZnGa2O4. The intensity of the diffraction peak from the (0002) plane of the MGZO thin films was enhanced as the sputteringpower increased. The (0002) peak positions of the MGZO thin films was shifted toward, a high diffraction angle as thesputtering power increased. Cross-sectional field emission scanning electron microscopy images of the MGZO thin filmsshowed that all of these films had a columnar structure and their thickness increased with an increase in the sputtering power.MGZO thin film deposited at the sputtering power of 200W showed the best electrical characteristics in terms of the carrierconcentration (4.71×1020cm−3), charge carrier mobility (10.2cm2V−1s−1) and a minimum resistivity (1.3×10−3Ωcm). A UV-visible spectroscopy assessment showed that the MGZO thin films had high transmittance of more than 80% in the visibleregion and that the absorption edges of MGZO thin films were very sharp and shifted toward the higher wavelength side, from270nm to 340nm, with an increase in the sputtering power. The band-gap energy of MGZO thin films was widened from3.74eV to 3.92eV with the change in the sputtering power.

Transparent conducting oxide (TCO) films are widely used for optoelectronic applications. Among TCO materials,zinc oxide (ZnO) has been studied extensively for its high optical transmission and electrical conduction. In this study, the effectsof O2 plasma pretreatment on the properties of Ga-doped ZnO films (GZO) on polyethylene naphthalate (PEN) substrate werestudied. The O2 plasma pretreatment process was used instead of conventional oxide buffer layers. The O2 plasma treatmentprocess has several merits compared with the oxide buffer layer treatment, especially on a mass production scale. In this process,an additional sputtering system for oxide composition is not needed and the plasma treatment process is easily adopted as anin-line process. GZO films were fabricated by RF magnetron sputtering process. To improve surface energy and adhesionbetween the PEN substrate and the GZO film, the O2 plasma pre-treatment process was used prior to GZO sputtering. As theRF power and the treatment time increased, the contact angle decreased and the RMS surface roughness increased significantly.It is believed that the surface energy and adhesive force of the polymer surfaces increased with the O2 plasma treatment andthat the crystallinity and grain size of the GZO films increased. When the RF power was 100W and the treatment time was120 sec in the O2 plasma pretreatment process, the resistivity of the GZO films on the PEN substrate was 1.05×10-3Ω-cm,which is an appropriate range for most optoelectronic applications.

Changes in the surface morphology and light scattering of textured Al doped ZnO thin films on glasssubstrates prepared by rf magnetron sputtering were investigated. As-deposited ZnO:Al films show a hightransmittance of above 80% in the visible range and a low electrical resistivity of 4.5×10-4Ω·cm. The surfacemorphology of textured ZnO:Al films are closely dependent on the deposition parameters of heater temperature,working pressure, and etching time in the etching process. The optimized surface morphology with a cratershape is obtained at a heater temperature of 350oC, working pressure of 0.5 mtorr, and etching time of 45seconds. The optical properties of light transmittance, haze, and angular distribution function (ADF) aresignificantly affected by the resulting surface morphologies of textured films. The film surfaces, havinguniformly size-distributed craters, represent good light scattering properties of high haze and ADF values.Compared with commercial Asahi U (SnO2:F) substrates, the suitability of textured ZnO:Al films as frontelectrode material for amorphous silicon thin film solar cells is also estimated with respect to electrical andoptical properties.

첨가제로 Al2O3가 포함된 ZnO 소결체가 타깃을 이용하여 RF 마그네트론 스퍼터링법으로 Al이 첨가된 ZnO박막을 증착하고, 타깃에 첨가된 Al2O3</TEX>의 농도와 증착시 스퍼터링장치내의 기판위치에 따른 박막의 물성 변화를 고찰하였다. 타깃의 Al2O3 첨가농도가 2wt%인 경우에 비저항치 8 × 10-3 Ω-cm인 박막이 증차되었다. 또한 Al2O3</TEX>가 2wt%이상 첨가된 경우는 모든 Al이 박막내부에서 Zn를 치환하여 전자주게로의 역할을 하지 못하고, 오히려 치환되지 못한 Al원자의 중성 불순물 산란효과에 의해 박막의 비저항이 증가하였다. 타깃의 마모영역 위에서 증착된 Al을 첨가한 ZnO 박막은 그 영역 KR에서 증착된 박막보다 높은 비저항값을 나타냈으며, 이는 큰 에너지를 가지는 산소입자의 충돌에 기인한 것으로 여겨진다.