A ZIF-8 membrane was prepared via counter diffusion method. To control the diffusion rate, two supports with different pore structure were employed, conventional and modified α-Al2O3 disc; disc A and disc B. The ZIF-8 membranes are derived their name from the supports; ZIF-8-A and ZIF-8-B. While ZIF-8-A was grown at the surface of the disc A, ZIF-8-B was grown inside the disc B. At 200 °C, ZIF-8-A and -B exhibited H2/CO2 separation factor (SF) of 6.69 and 8.21. In long-term thermal stability tests, both ZIF-8-A and -B were withstood their properties at 200 and 250 °C for 72 h. At 300 °C, SF of ZIF-8-A fell after ~2 h, however, that of ZIF-8-B dropped after ~10 h. To sum up these features, ZIF-8-B showed higher H2 selectivity and thermal stability than ZIF-8-A, since ZIF-8 membrane was synthesized inside of the support.

Piezodialysis involves the preferential permeation of ions over water molecules through charge mosaic membranes (CMM). This energy-efficient process incites interest as an alternative route to water desalination. But the development of effective CMMs remains a challenge due to their difficult fabrication. Herein, preparation of the positive and negative domains of a CMM were optimized. Negative poly(sodium styrene sulfonate) was blended in poly(vinyl alcohol) matrix, same as that of the positive poly(diallyldimethyl ammonium chloride). Results reveal that a balance between the two domains is critical for the CMM to achieve high salt enrichment and mechanical stability. This work was supported by NRF funded by the Korea government (MSIP) (No. 2017R1A2B2002109) and Basic Science Research Program of Ministry of Education (2009-0093816).

식품 포장재 내 곤충 침입을 방지하기 위해 방향유를 함유한 방충 필름이 연구되고 있으나 파일럿 규모의 생산 장비를 이용한 연구는 드물다. 따라서 본 연구의 목적은 파일럿 규모의 생산 장비로 미세캡슐화된 시나몬방향유(cinnamon oil, CO) 함유 식품 포장 필름을 개발하고 필름의 방충효과와 이화학적 특성을 평가하는 것이었다. 모든 필름은 파일럿 규모의 그라비아 인쇄기(Roto Gravure Printing Press, Ilsung Machinary Co., Ltd., Gumi, Korea)와 적층기(Dry laminating & Extrusion laminating machine, INT CO., Ltd; Ansan, Korea)로 제작되었다. 폴리비닐알코올 수용액(0.02%, w/w, 폴리비닐알코올/증류수)을 사용하여 CO (5.2%, w/w, CO/PVA 수용액) 미세캡슐 에멀션을 제조하였고, 0,1 또는 2% (w/w, CO/미세캡슐 CO 에멀션)의 미세캡슐 CO 에멀션을 잉크(54 또는 61%, w/w, 잉크/전체 혼합액)와 시너(thinner) (23 또는 26%, w/w, 시너/전체 혼합액)에 혼합하여 인쇄 용액을 만들었다. 만들어진 용액을 폴리프로필렌필름(30 μm)에 그라비아 인쇄기로 인쇄한 후, 인쇄된 면에 저밀도폴리에틸렌 필름(40 μm)을 올려놓고 적층(lamination)하여 방충 필름(75 μm 두께)을 제작하였다. 소규모와 파일럿 규모로 진행된 필름의 방충효과 측정에는 화랑곡 나방(Plodia interpunctella) 유충을 사용하였고, 개발된 필름의 시남알데하이드 방출률, 인장 및 수분 차단 특성 그리고 열 중량을 분석하였다. 파일럿 규모 인쇄기와 적층기는 미세캡슐 CO 에멀션이 사용된 방출필름을 연속적이고 균일하게 생산하였다. 미세캡슐 2% CO 에멀션 제형으로 제작된 필름이 가장 높은 방충능을 보였으며, 미세캡슐화가 방충효과를 유지하면서 시남알데하이드의 보존성을 높여 방충효과를 유지하는 데 효과적임을 알 수 있었다. 열 중량분석 결과를 통해 미세캡슐화와 적층이 CO의 휘발을 막는 데 효과적임을 확인했다. 필름의 인장강도, 신장률, 탄성률 그리고 수증기 투과성은 각각 40.4-45.4 MPa, 87.1-87.6%, 831.8-838.1 MPa, 그리고 0.0078-0.0082 g·mm·h-1·kPa-1·m-2이 었으며, 이 결과들은 개발된 방충 필름의 인장 및 수분특성에 변화를 주지 않는 것으로 관찰되었다(p>0.05). 연구를 통해 파일럿 플랜트 규모에서 방충 필름을 성공적으로 제작할 수 있었고, 방충효과와 이화학적 특성 결과를 통해 제작된 방충 필름의 상업적 적용 가능성을 확인할 수 있었다.

To establish low-temperature process conditions, process-property correlation has been investigated for Ga-doped ZnO (GZO) thin films deposited by pulsed DC magnetron sputtering. Thickness of GZO films and deposition temperature were varied from 50 to 500 nm and from room temperature to 250 oC, respectively. Electrical properties of the GZO films initially improved with increase of temperature to 150 oC, but deteriorated subsequently with further increase of the temperature. At lower temperatures, the electrical properties improved with increasing thickness; however, at higher temperatures, increasing thickness resulted in deteriorated electrical properties. Such changes in electrical properties were correlated to the microstructural evolution, which is dependent on the deposition temperature and the film thickness. While the GZO films had c-axis preferred orientation due to preferred nucleation, structural disordering with increasing deposition temperature and film thickness promoted grain growth with a-axis orientation. Consequently, it was possible to obtain a good electrical property at relatively low deposition temperature with small thickness.

A thin film thermoelectric generator that consisted of 5 p/n pairs was fabricated with 1 μm-thick n-type In3Sb1Te2 and p-type Ge2Sb2Te5 deposited via radio frequency magnetron sputtering. First, 1 μm-thick GST and IST thin films were deposited at 250 oC and room temperature, respectively, via radio-frequency sputtering; these films were annealed from 250 to 450 oC via rapid thermal annealing. The optimal power factor was found at an annealing temperature of 400 oC for 10 min. To demonstrate thermoelectric generation, we measured the output voltage and estimated the maximum power of the n-IST/ p-GST generator by imposing a temperature difference between the hot and cold junctions. The maximum output voltage and the estimated maximum power of the 1 μm-thick n-IST/p-GST TE generators are approximately 17.1 mV and 5.1 nW at ΔT = 12K, respectively.

This study describes the effects of polyurethane/loess powder (PU/LP) nanofiber thin films composite produced from electrospun for absorption volatile organic compounds (VOCs) from air. Environmental issue has become a focus with improving people's living quality. The VOCs are one of the factors that affect the environmental safety. So, in order to improve the environment and safety for people, many air cleaning techniques have been investigated. One of the methods is nanofiber filtration technology. In this study, the PU nanofiber thin film has been studied that it has the adsorption of VOCs capacity, and LP nanoparticles (NPs) can be used as an additive to load into PU nanofiber thin film by electrospinning. For studying PU/LP nanofiber thin films's absorption of VOCs capacity, 4 samples (0, 10, 30, and 50 wt% LP with respect to PU) were manufactured, respectively. The results show that PU composite mats containing 30 wt% LP NPs has the highest VOCs absorption capacity, and the adsorption capacity for toluene was the highest compared to benzene and chloroform.

Transparent organic-inorganic hybrid hard coating films were prepared by the addition of SiO2 or ZrO2, as an inorganic filler to improve the hardness property, filler was highly dispersed in the acrylic resin. To improve the compatibility in the acrylic resin, SiO2 or ZrO2 is surface-modified using various silanes with variation of the modification time and silane content. Depending on the content and kind of the modified inorganic oxide, transparent modified inorganic sols were formulated in acryl resin. Then, the sols were bar coated and cured on PET films to investigate the optical and mechanical properties. The optimized film, which has a modified ZrO2 content of 4 wt% markedly improved in terms of the hardness, haze, and transparency as compared to neat acrylate resin and acrylate resin containing modified SiO2 content of 8 wt%. Meanwhile, the low transparency and high haze of these films slowly appeared at SiO2 content above 10 wt% and ZrO2 content of 5 wt%, but the hardness values were maintained at 2H and 3H, respectively, in comparison with the HB of neat acrylate resin.

In this study, we report a general method for preparation of a one-dimensional (1D) arrangement of Au nanoparticles on single-walled carbon nanotubes (SWNTs) using biologically programmed peptides as structure-guiding 1D templates. The peptides were designed by the combination of glutamic acid (E), glycine (G), and phenylalanine (F) amino acids; peptides efficiently debundled and exfoliated the SWNTs for stability of the dispersion and guided the growth of the array of Au nanoparticles in a controllable manner. Moreover, we demonstrated the superior ability of 1D nanohybrids as flexible, transparent, and conducting materials. The highly stable dispersion of 1D nanohybrids in aqueous solution enabled the fabrication of flexible, transparent, and conductive nanohybrid films using vacuum filtration, resulting in good optical and electrical properties.

We performed this study to understand the effect of a single-crystalline anode on the mechanical properties of asdeposited films during electrochemical deposition. We used a (111) single- crystalline Cu plate as an anode, and Si substrates with Cr/Au conductive seed layers were prepared for the cathode. Electrodeposition was performed with a standard 3-electrode system in copper sulfate electrolyte. Interestingly, the grain boundaries of the as-deposited Cu thin films using single-crystalline Cu anode were not distinct; this is in contrast to the easily recognizable grain boundaries of the Cu thin films that were formed using a poly-crystalline Cu anode. Tensile testing was performed to obtain the mechanical properties of the Cu thin films. Ultimate tensile strength and elongation to failure of the Cu thin films fabricated using the (111) single-crystalline Cu anode were found to have increased by approximately 52 % and 37%, respectively, compared with those values of the Cu thin films fabricated using apoly-crystalline Cu anode. We applied ultrasonic irradiation during electrodeposition to disturb the uniform stream; we then observed no single-crystalline anode effect. Consequently, it is presumed that the single-crystalline Cu anode can induce a directional/uniform stream of ions in the electrolyte that can create films with smeared grain boundaries, which boundaries strongly affect the mechanical properties of the electrodeposited Cu films.

We have investigated the properties of thin film transistors(TFT) fabricated using zinc tin oxide(ZTO) thin films deposited via on-axis sputtering and FTS methods. ZTO thin films deposited by FTS showed lower root-mean-square(RMS) roughness and more uniformity than those deposited via on-axis sputtering. We observed enhanced electrical properties of ZTO TFT deposited via FTS. The ZTO films were deposited at room temperature via on-axis sputtering and FTS. The as-deposited ZTO films were annealed at 400 oC. The TFT using the ZTO films deposited via FTS process exhibited a high mobility of 12.91 cm2/V.s, a low swing of 0.80 V/decade, Vth of 5.78 V, and a high Ion/off ratio of 2.52 × 106.

大韓民国映画史の第一歩を刻んだ映画人の一人として知られる崔寅奎 監督。現在韓国での一般的な彼に対する評価は、日本植民地期には、対 日売国(韓国語では ‘친일’) 映画を作り続けたが、解放後、その売国行為 の免罪符として民族の解放をうたいあげる自由万歳(자유만세)等いわゆ る解放三部作映画を作ったとされる 。筆者は、彼の現存する植民地末期三作品のうち、比較的‘売国(친일)’ 性がはっきりしないとされる『授業料(수업료)』をのぞく二作品、すなわ ち『家なき天使(집 없는 천사)』ならびに日本人監督今井正との共同監督作 品である『愛と誓ひ(사랑과 맹세)』の再解釈を通して、彼のこの時代の映画 が持つメッセージの二重性を指摘する。そしてそのメッセージに含まれ る、朝鮮民族の、大和民族と平等な政治的権利獲得を狙う戦略的意図の 存在可能性を指摘する。最後に、植民地期朝鮮映画研究の課題、すなわ ち社会的認知フレーム考慮の必要性について提起する。

Homogeneous liquid crystal (LC) alignment on hafnium strontium oxide (HfSrO) films prepared by sol-gel process via ion-beam (IB) bombardment was investigated. Uniform LC alignment was achieved on the IB-irradiated HfSrO films at IB intensity of 1.8 keV. We confirmed the effect of surface morphology on LC alignment using field-emission scanning electron microscope (FE-SEM). In addition, we observed electro-optical characteristics of the twisted-nematic (TN)-LC cells based on HfSrO films to verify the possibility of LC display (LCD) application.

Dy3+ and Eu3+-codoped SrWO4 phosphor thin films were deposited on sapphire substrates by radio frequency magnetron sputtering by changing the growth and thermal annealing temperatures. The results show that the structural and optical properties of the phosphor thin films depended on the growth and thermal annealing temperatures. All the phosphor thin films, irrespective of the growth or the thermal annealing temperatures, exhibited tetragonal structures with a dominant (112) diffraction peak. The thin films deposited at a growth temperature of 100 oC and a thermal annealing temperature of 650 oC showed average transmittances of 87.5% and 88.4% in the wavelength range of 500-1100 nm and band gap energy values of 4.00 and 4.20 eV, respectively. The excitation spectra of the phosphor thin films showed a broad charge transfer band that peaked at 234 nm, which is in the range of 200-270 nm. The emission spectra under ultraviolet excitation at 234 nm showed an intense emission peak at 572 nm and several weaker bands at 479, 612, 660, and 758 nm. These results suggest that the SrWO4: Dy3+, Eu3+ thin films can be used as white light emitting materials suitable for applications in display and solid-state lighting.

이글은 최근까지 세계적으로 주목 받고 있는 타이완의 영화감독 허우샤오시엔의 영화에 대한 새로운 해석이다. 그중에서도 1989년 작품 《비정성시(悲情城市:A City of Sadness : 1989)》 를 재조명하는 것이다. 그리고 지금의 시점에서 그의 영화를 다시 보면서 작품 속에서 그의 영화 가 갖고 있는 특성과 그 영화들이 가지는 시대적 배경의 모습, 그러한 것들과 인간적 환경에 대 하여 주목한다. 이는 그가 말했듯이 영화를 만드는 일은 결국 역사와 사람을 알아가는 과정일 것이다. 그는 인간의 삶이 의지적인 것과 결코 의지적이지 않은 반대의 면이 있다는 것을 표현하 고자 했다. 특히 인간이 가지는 원초적 진실함이 어떻게 넓은 중국 속에서, 타이완이라는 중국의 한 부분 지역에서, 그리고도 극히 일부분에 불과한 지역에서 겪는 상황에 대해서, 그리고 시대의 변화가 많은 변곡점과 마주치면서 겪는 인간의 한계를 영화의 매개체를 통하여 특히, 그가 만든 스크린을 통하여 어떻게 비추어내는가 하는 것을 보여주고 있다. 그의 영화가 유명하거나 많은 상을 받아서가 아니라 그가 감독하였거나 제작한 영화들은 시대가 바뀌어도 항상 재조명되고 관 객들로 하여금 다시 감상되어야 할 필요가 크므로 우리는 그의 작품에 대해서 특히 그의 8년만의 역작이며, 아름답지만 슬픈 《悲情城市》를 다른 작품과 더불어 재조명 하고자 한다.

Forecasting of box office performance after a film release is very important, from the viewpoint of increase profitability by reducing the production cost and the marketing cost. Analysis of psychological factors such as word-of-mouth and expert assessment is essential, but hard to perform due to the difficulties of data collection. Information technology such as web crawling and text mining can help to overcome this situation. For effective text mining, categorization of objects is required. In this perspective, the objective of this study is to provide a framework for classifying films according to their characteristics. Data including psychological factors are collected from Web sites using the web crawling. A clustering analysis is conducted to classify films and a series of one-way ANOVA analysis are conducted to statistically verify the differences of characteristics among groups. The result of the cluster analysis based on the review and revenues shows that the films can be categorized into four distinct groups and the differences of characteristics are statistically significant. The first group is high sales of the box office and the number of clicks on reviews is higher than other groups. The characteristic of the second group is similar with the 1st group, while the length of review is longer and the box office sales are not good. The third group's audiences prefer to documentaries and animations and the number of comments and interests are significantly lower than other groups. The last group prefer to criminal, thriller and suspense genre. Correspondence analysis is also conducted to match the groups and intrinsic characteristics of films such as genre, movie rating and nation.

Aluminum oxide (Al2O3) thin films were grown by atomic layer deposition (ALD) using a new Al metalorganic precursor, dimethyl aluminum sec-butoxide (C12H30Al2O2), and water vapor (H2O) as the reactant at deposition temperatures ranging from 150 to 300 oC. The ALD process showed typical self-limited film growth with precursor and reactant pulsing time at 250 oC; the growth rate was 0.095 nm/cycle, with no incubation cycle. This is relatively lower and more controllable than the growth rate in the typical ALD-Al2O3 process, which uses trimethyl aluminum (TMA) and shows a growth rate of 0.11 nm/ cycle. The as-deposited ALD-Al2O3 film was amorphous; X-ray diffraction and transmission electron microscopy confirmed that its amorphous state was maintained even after annealing at 1000 oC. The refractive index of the ALD-Al2O3 films ranged from 1.45 to 1.67; these values were dependent on the deposition temperature. X-ray photoelectron spectroscopy showed that the ALD-Al2O3 films deposited at 250oC were stoichiometric, with no carbon impurity. The step coverage of the ALD-Al2O3 film was perfect, at approximately 100%, at the dual trench structure, with an aspect ratio of approximately 6.3 (top opening size of 40 nm). With capacitance-voltage measurements of the Al/ALD-Al2O3/p-Si structure, the dielectric constant of the ALDAl2O3 films deposited at 250 oC was determined to be ~8.1, with a leakage current density on the order of 10−8 A/cm2 at 1 V.

A multi-step deposition process for the gap-filling of submicrometer trenches using dimethyldimethoxysilane (DMDMOS), (CH3)2Si(OCH3)2, and CxHyOz by plasma enhanced chemical vapor deposition (PECVD) is presented. The multistep process consisted of pre-treatment, deposition, and post-treatment in each deposition step. We obtained low-k films with superior gap-filling properties on the trench patterns without voids or delamination. The newly developed technique for the gapfilling of submicrometer features will have a great impact on inter metal dielectric (IMD) and shallow trench isolation (STI) processes for the next generation of microelectronic devices. Moreover, this bottom up gap-fill mode is expected to be universally for other chemical vapor deposition systems.

We improve the energy conversion efficiency (ECE) of a dye sensitized solar cell (DSSC) by preparing a working electrode (WE) with localized surface plasmon resonance (LSPR) by inducing Au thin films with thickness of 0.0 to 5.0 nm, deposited via sputtering. Field emission scanning electron microscopy and atomic force microscopy were used to characterize the microstructure of the blocking layer (BL) of the Au thin films. Micro-Raman measurement was employed to confirm the LSPR effect, and a solar simulator and potentiostat were used to evaluate the photovoltaic properties, including the impedance and the I-V of the DSSC of the Au thin films. The results of the microstructural analysis confirmed that nano-sized Au agglomerates were present at certain thicknesses. The photovoltaic results show that the ECE reached a value of 5.34% with a 1-nm thick-Au thin film compared to the value of 5.15 % without the Au thin film. This improvement was a result of the increase in the LSPR of the TiO2 layer that resulted from the Au thin film coating. Our results imply that the ECE of a DSSC may be improved by coating with a proper thickness of Au thin film on the BL.

The reduction in solar radiation transmittance(SRT) because of dust and other foreign materials was experimentally tested in two types of greenhouses with the intent to obtain basic data for establishing maintenance and management guidelines for greenhouse cover materials. The test results in the greenhouse in Gyehwa-do estimated the amount of removed dust at 16.8– 1,021.6 mg·m-2(average: 520.7 mg·m-2), and the dust amount varied widely with the measurement points. The SRT measured in triplicate before and after dust removal ranged 68.5–80.9% and 80.9–87.2%, respectively; thus, there was an improvement in SRT by about 8.1% after dusting. In contrast, the greenhouse in Gyeongsang National University did not exhibit great fluctuations in the coefficient of determination(correlation coefficient) regardless of the daily total, average, or maximum horizontal surface radiation; the SRT gradually decreased over time. The SRT increased or decreased, showing clearly different patterns in summer and winter half years, as did the coefficients of determination(0.468–0.828). Dust was measured to be in the range 747.1– 983.1 mg·m-2(average: 840.1 mg·m-2), without great differences between the measurement points, unlike in the case of the greenhouse in Gyehwa-do. The SRT measured before and after the dust removal ranged 73.0–80.5% and 81.0–88.6%, respectively, showing an average improvement of about 7.9%. The SRT measured after washing with water ranged 88.7–90.6%, demonstrating a greater improvement with an average increase rate of 13.0%, which is 5.1% higher than the increase rate after dust removal. These results suggest that although washing with water rather than dust removal improves SRT to a greater extent(13.0% vs. 7.9%), dust removal alone is considered to provide considerable improvement in SRT. Comparison of the images of the unused film and pre-dusting film under the microscope revealed that foreign materials such as dust were adhered to the pre-dusting film, and variations were observed according to the magnification ratio and photographed area.

We developed an Al sputtering process by varying the plasma power, process temperature, and film thickness. We observed an increase of hillock distribution and average diameter with increasing plasma power, process temperature, and film thickness. Since the roughness of a film increases with the increase of the distribution and average size of hillocks, the control of hillock formation is a key factor in the reduction of Al corrosion. We observed the lowest hillock formation at 30 W and 100 oC. This growth characteristic of sputtered Al thin films will be useful for the reduction of Al corrosion in the future of the electronic packaging field.