A study was conducted to determine the effects of the cattle manure (CM) application on the botanical composition and micro-mineral contents (Fe, Mn, Cu, Zn) of grazing pasture at the experimental field of Livestock Division, Subtropical Animal Experiment Station, National Institute of Animal Science from year 2003 to 2005. The experiment was arranged in a randomized complete block design with three replications. The treatment consisted of T1: 100% chemical fertilizer (CF 100%), T2: 50% CF +50% CM, T3: 25% CF +75% CM, T4: 100% cattle manure (CM 100%), T5: 100% CM (1st yr.)+ 100% CF (2nd yr.) + 100% CM (3rd yr.), T6: 100% CM (1st yr.)+ 100% CF (2nd yr.)+ 100% CF (3rd yr.). The botanical composition of grassland for grass, legumes, and weeds showed that the rate of legumes was increased in all treatments. The weeds rate in T4 was the highest in comparison to the other treatments. For micro-mineral contents T5 showed the highest average Fe contents of 262.08 ppm and T1 showed the lowest (199.20 ppm). Mn contents was the highest in T1 among the other treatments. Zn contents was the highest in T3 as compared with other treatments. Cu contents was the highest in T6 as compared with other treatments. The results of this experiments indicated that micro-mineral contents of change was effect of legumes increased than treatment

In 450mm wafers production environment for next-generation semiconductor production, one of the most significant features is the adoption of full automation to the whole manufacturing processes involved. The full automation system applied to the whole manufacturing processes will prevent the workers from intervening the manufacturing processes as much as possible and increase the importance of each individual wafer noticeably, and thus require a more robust scheduling system for entire semiconductor manufacturing processes. The scheduling system for 450mm wafers production also should be capable of monitoring the status of each individual wafer and collecting useful fab data in real time. Based on data (or information) gathered in each process, the real-time scheduling system function efficiently to control the whole semiconductor manufacturing processes. In this study, we first carry out preliminary survey on the system requirements and the necessary functions for constructing the real time scheduling system with considering the changes from 300mm wafer production environment to 450mm wafer production environment, and then propose the scheduler system architectures for the cluster-type production processes which are the general in 450mm wafer production environment for the efficient production scheduling. The system architectures proposed in this study involve the modules for real-time scheduling, the modules for supporting the cluster-type production, the modules for finding optimal schedules, and so on. Also, we provide the specifications of the key required functions and capabilities of the modules and the relationship among the modules proposed.　

Transparent conducting oxide (TCO) films are widely used for optoelectronic applications. Among TCO materials,zinc oxide (ZnO) has been studied extensively for its high optical transmission and electrical conduction. In this study, the effectsof O2 plasma pretreatment on the properties of Ga-doped ZnO films (GZO) on polyethylene naphthalate (PEN) substrate werestudied. The O2 plasma pretreatment process was used instead of conventional oxide buffer layers. The O2 plasma treatmentprocess has several merits compared with the oxide buffer layer treatment, especially on a mass production scale. In this process,an additional sputtering system for oxide composition is not needed and the plasma treatment process is easily adopted as anin-line process. GZO films were fabricated by RF magnetron sputtering process. To improve surface energy and adhesionbetween the PEN substrate and the GZO film, the O2 plasma pre-treatment process was used prior to GZO sputtering. As theRF power and the treatment time increased, the contact angle decreased and the RMS surface roughness increased significantly.It is believed that the surface energy and adhesive force of the polymer surfaces increased with the O2 plasma treatment andthat the crystallinity and grain size of the GZO films increased. When the RF power was 100W and the treatment time was120 sec in the O2 plasma pretreatment process, the resistivity of the GZO films on the PEN substrate was 1.05×10-3Ω-cm,which is an appropriate range for most optoelectronic applications.

본 연구에서는 내열성 고분자인 폴리에테르술폰을 이용하여 전기방사의 방법으로 섬유 형태의 다공성 막을 제조하였다. 여기에 Nafion 용액을 함침 시켜 고분자 전해질 연료전지용 막을 제조하였다. 열중량 분석을 통해, 현재 고분자 전해질 막으로 상용화되어 널리 쓰이고 있는 Nafion 212보다 더 높은 열적 안정성을 갖는 것을 확인하였다. 주사전자현미경 측정을 통하여, 다공성의 폴리에테르술폰 막에 Nafion 용액이 수소이온 전도체로서 잘 함침 되어 있음을 확인할 수 있었다. AC impedance 측정 결과, 100°C 이하의 온도범위에는 수소 이온 전도도가 10 -2 S/cm로 나왔으며, 100°C 이상의 범위에서는 10 -3 S/cm의 값을 나타냈다. 0.6 V, 90°C의 조건에서 389 mA/㎠의 전류밀도를 나타내었다. Nafion 212 상용 막이 75°C에서 최대 성능을 나타내는데 반해, Nafion 용액을 함침시킨 폴리에테르술폰 막은 90°C에서 최대 성능을 갖는 것으로 나타났다.

The egg size and weight of the gray field slug, Deroceras reticulatum Müller, was 1.91×2.19 ㎜ and 3.3 ㎎ at 24℃, respectively. Its weight increased from newly laid eggs to adults for 17 weeks at four temperature regimes and was heaviest at 20℃, followed by 24, 16 and 28℃. Likewise, hatching rate of the egg batches was highest with 95% at 20℃, followed by 24, 16 and 28℃ with significant differences. The number of eggs in the batches was increased with 20 at 20℃ while it was only 10 at 28℃. The average accumulated egg-laying days was longest with 15 days at 20℃ while shortest with 9 days at 24℃. The range of egg-laying period was shortest with 84-134 days at 16℃ and longest at 20℃. Thus, the total number of eggs laid by adult D. reticulatum was highest with 217 at 20℃ and lowest with 105 at 16℃. The egg period was 12-19 days while the juvenile period and adult longevity were 51-68 days and 85-134 days, respectively. The life span of D. reticulatum from egg to adult was longest with 216 days at 20℃, followed by 193 days at 24℃, 170 days at 16℃ and 151 days at 28℃. Accordingly, the most favorable temperature for the oviposition, development and longevity of D. reticulatum is 20℃.

To get more comprehensive understandings about the microbial diversity near the seawater of Ulleung Island, East sea of Korea, the bacterial identification base on 16S rDNA and their carbon source utilization patterns were analysed through the six surface water samples collected at June 23 to 25, 2007. The results are as follows; the population densities of aerobic heterotrophic and oligotrophic bacteria were from 1.9±0.6×104~6.3±0.7 ×104 cfu ml−1 and from 1.7±0.4×103~2.5±0.4×103 cfu ml−1 during sampling periods, respectively. Among 121 isolated stains, the dominant taxa are Pseudoalteromonas spp. (30 colonies) and Alteromonas spp. (17 colonies). Thirty-senven species-level strains base on 16S rDNA sequencing data are identified, which comprised Gammaproteobacteria (14 strains), Alphaproteobacteria (6 strains), Flavobacteria (6 strains), Actinobacteridae (4 strains), Firmicutes (4 strains), Deinococci (2 strains), Betaproteobacteria (1 strains). The carbon utilization patterns by assay of Biolog-microplate, α-D-glucose are used by 88.9% of the 27 strains of Gram-negative bacteria and more than 80% of them also consumed L-arabinose, D-trehalose, L-alanine, and pyruvic acid methyl ester. On the other hand, all the 10 strains of Gram-positive bacteria used α-D-glucose, and more than 80% of them also exploited maltose, palatinose, D-trehalose, turanose, D-xylose, and pyruvic acid.

UV 경화형 수지를 바인더로 활용하고 다양한 크기, 형태, 재질의 입자를 첨가하여 분산시킨 분 산액을 TAC(triacetylcellulose) 필름에 코팅한 후 경화시켜 난반사필름을 제조 하는데 이때 투입된 입 자들이 필름의 물성에 미치는 영향을 분석하였다. 그 결과 입자의 형태가 구형 일 때 표면요철 형성에 유리하며 크기가 작은 입자보다는 큰 입자를 사용할 때 표면요철 형성이 용이하다는 것을 확인할 수 있었다. 입자의 재질이 표면요철에 미치는 영향은 입자의 크기나 형태에 의한 영향보다는 상대적으로 작았다. 입자와 바인더 수지는 각각 굴절율이 다르며 이에 따라서 바인더수지와 입자의 굴절율 차가 달라지게 된다. 따라서 입자의 재질에 따라 PS(polystyrene), silica, PMMA(poly(methyl methacrylate)) 순서로 total haze 변화율에 영향을 미치는 것을 확인할 수 있었다.