Fluorine (F) recovery from wet process phosphoric acid (WPA) is essential for sustainable resource utilization and environmental protection. This work systematically investigates the F recovery mechanism by air stripping from three simulated systems: H3PO4- H2SiF6-H2O, H3PO4- HF-H2O, H3PO4- H2SiF6-HF-Al3+-H2O, and from two industrial systems: WPA and WPA-Al3+ under different stripping temperatures (60–110 ℃) and stripping times (0–120 min). The influence on the existence form of F, the content of Al3+ cations and the addition of active silica on the F removal rate in the phosphoric acid solution is studied by analyzing the changes in the contents of F, P and Si. The results indicate that the F in the form of H2SiF6 is more easily released from the phosphoric acid solution than that in the form of HF. While, the release of F is inhibited in the presence of the Al3+ in the solution due to the formation of Al-F complexes that are characterized by 19F NMR, 31Si NMR and FTIR techniques. Interestingly, the addition of active silica can promote the conversion of HF to H2SiF6 in the solution and significantly improve the release rate of F. The researching results can provide an important guidance for industrial practice of WPA.

Graphene-based materials show excellent properties in various applications because of their electrical properties, large surface areas, and high tolerance for chemical modification. The use of wet-process is a promising way for their mass production. Heteroatom doping is one of the common methods to improve their electrical, physical, and electrochemical properties. In this work, we develop a new route for the production B-doped graphene-based materials using low-temperature wet-process, which is the reaction between graphene oxide suspensions and a BH3 adduct in tetrahydrofuran under reflux. Elemental mapping images show well-dispersed B atoms along the materials. Various spectroscopic characterizations confirm the reduction of the graphene oxide and incorporation of B atoms into the carbon network as high as ~ 2 at%. The materials showed electrocatalytic activity for oxygen reduction reactions.

In this work, TiO2 3D nanostructures (TF30) were prepared via a facile wet chemical process using ammonium hexafluorotitanate. The synthesized 3D TiO2 nanostructures exhibited well-defined crystalline and hierarchical structures assembled from TiO2 nanorods with different thicknesses and diameters, which comprised numerous small beads. Moreover, the maximum specific surface area of TiO2 3D nanostructures was observed to be 191 m2g-1, with concentration of F ions on the surface being 2 at%. The TiO2 3D nanostructures were tested as photocatalysts under UV irradiation using Rhodamine B solution in order to determine their photocatalytic performance. The TiO2 3D nanostructures showed a higher photocatalytic activity than that of the other TiO2 samples, which was likely associated with the combined effects of a high crystallinity, unique features of the hierarchical structure, a high specific surface area, and the advantage of adsorbing F ions.

A facile one-pot wet chemical process to prepare pure anatase TiO2 hollow structures using ammonium hexafluorotitanate as a precursor is developed. By defining the formic acid ratio, we fabricate TiO2 hollow structures containing fluorine on the surface. The TiO2 hollow sphere is composed of an anatase phase containing fluorine by various analytical techniques. A possible formation mechanism for the obtained hollow samples by self-transformation and Ostwald ripening is proposed. The TiO2 hollow structures containing fluorine exhibits 1.2 - 2.7 times higher performance than their counterparts in photocatalytic activity. The enhanced photocatalytic activity of the TiO2 hollow structures is attributed to the combined effects of high crystallinity, specific surface area (62 m2g-1), and the advantage of surface fluorine ions (at 8%) having strong electron-withdrawing ability of the surface ≡ Ti-F groups reduces the recombination of photogenerated electrons and holes.

F-containing TiO2 nanopowders are synthesized using simple wet processes (precipitation-based and hydrothermal) from ammonium hexafluorotitanate (AHFT, (NH4)2TiF6) as a precursor to apply as a photocatalyst for the degradation of rhodamine B (RhB). The surface properties of the prepared samples are evaluated using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), field-emission scanning electron microscopy (FESEM), and transmission electron microscopy (TEM). The results confirm that the synthesized anatase TiO2 has sphere-like shapes, with numerous small nanoparticles containing fluorine on the surface. The photocatalytic activity of F-containing TiO2 compared with F-free TiO2 is characterized by measuring the degradation of RhB using a xenon lamp. The photocatalytic degradation of F-containing TiO2 exhibits improved photocatalytic activity, based on the positive effects of adsorbed F ions on the surface.

Multi-walled carbon nanotube (MWCNT)–copper (Cu) composites are successfully fabricated by a combination of a binder-free wet mixing and spark plasma sintering (SPS) process. The SPS is performed under various conditions to investigate optimized processing conditions for minimizing the structural defects of CNTs and densifying the MWCNT–Cu composites. The electrical conductivities of MWCNT–Cu composites are slightly increased for compositions containing up to 1 vol.% CNT and remain above the value for sintered Cu up to 2 vol.% CNT. Uniformly dispersed CNTs in the Cu matrix with clean interfaces between the treated MWCNT and Cu leading to effective electrical transfer from the treated MWCNT to the Cu is believed to be the origin of the improved electrical conductivity of the treated MWCNT–Cu composites. The results indicate the possibility of exploiting CNTs as a contributing reinforcement phase for improving the electrical conductivity and mechanical properties in the Cu matrix composites.

Alane(aluminum trihydride, AlH3)으로 명명되는 고에너지 물질인 삼수소알루미늄은 수소저장 물질로서 뿐만 아니라 우주항공분야의 고체 추진제나 방위산업의 화약제조용으로도 사용될 수 있다. 본 연구는 습식공정을 통하여 합성하고, 에테르를 세밀하게 분리하는 결정화 공정을 통하여 최종 수소화물을 추출하였다. 결정화 공정에서 삼수소알루미늄-에테레이트(AlH3·(C2H5)2O)가 alane으로 상변이하면서 입자가 성장하고, 85℃에서 2 시간의 결정화 시간이 이루어졌을 때 가장 안정된 결정상이 나타나는 모습을 확인하였다. 최종적으로 추출된 고체상 삼수소알루미늄은 막대모양의 γ-형태가 가장 많은 양을 차지하는 것으로 나타났으며, 크기는 50-100 μm 수준이었다

Ag nanoparticles are extensively studied and utilized due to their excellent catalysis, antibiosis and optical properties. They can be easily synthesized by chemical reduction methods and it is possible to prepare particles of uniform size and high purity. These methods are divided into vapor methods and liquid phase reduction methods. In the present study, Ag particles are prepared and analyzed through two chemical reduction methods using solvents containing a silver nitrate precursor. When Ag ions are reduced using a reductant in the aqueous solution, it is possible to control the Ag particle size by controlling the formic acid ratio. In addition, in the Polyol process, Ag nanoparticles prepared at various temperatures and reaction time conditions have multiple twinned and anisotropic structures, and the particle size variation can be confirmed using field emissions scanning electron microscopy and by analyzing the UV-vis spectrum.

The expansion of the display market could mass-produce the product which becomes the super-slim and ultra-lighting according to the demand of customer. This change etched the mobile display panel in order to make the thin glass. The wet etching refers to the process of removing selectively the unnecessary part in order to form the circuit pattern among the semi-conductor or the LCD manufacturing process. The wet etching can progress the etching about a large amount at a time but the thickness of glass is not smooth or not etched according to the process condition. In this study, the defect factor in the etching process tries to be analyze. The experimental design was established and the processing condition was optimized in order to minimize under non-etch part generation by the experiment of design.

Odor compounds and air-born microorganisms are simultaneously emitted from various aeration processes such as aerobic digestion, food-waste compositing, and carcass decomposition facilities that are biologically-treating wastes with high organic contents. The air streams emitted from these processes commonly contain sulfur-containing odorous compounds such as hydrogen sulfide(H2S) and bacterial bioaerosols. In this study, a wet-plasma method was applied to remove these air-born pollutants and to minimize safety issues. In addition, the effects of a gas retention time and a liquid-gas ratio were evaluated on removal efficiencies in the wet-plasma system. At the gas reaction time of 1.8 seconds and the liquid-gas ratio of 0.05 mLaq/Lg, the removal efficiency of bioaerosol was approximately 75 %, while the removal efficiency of H2S was lower than 20 %, indicating that the gaseous compound was not effectively oxidized by the plasma reaction at the low liquid addition. When the liquid-gas ratio was increased to 0.25 mLaq/Lg, the removal efficiencies of both H2S and bioaerosol increased to greater than 99 %. At the higher liquid-gas ratio, more ozone was generated by the wet-plasma reaction. The ozone generation was significantly affected by the input electrical energy, and it needed to be removed before discharged from the process.

This essay talks about research of robust design for quality improvement of production procedure of Wet Etchant. It suggested the optimum design method in consideration of specific capability value that is the way to maximize the quality of product in the production system by using Daguchi parameter design method while finding factors affecting product quality with analysis of production system of product A from producer D. Also, it set long term of 6months as noise factor and let it to be the robust design that can find the optimum condition of control factor that is dull to the changes of each month, that is the change in noise factor. The control factor which affects the product quality is decided as combination method, temperature of raw material, combination time and as there are too many possibilities for combination methods, we performed 4 methods first based on previous research data then derived three ways with product that passed SPEC and set as the factor. As a result of application of optimum production procedure suggested in this essay to the actual production process with its standardization, there was a effect of drop of more than 10particles in comparison to the particle number of previous product and also it brought the effect that resulted the stable number of particle of under 30 that is what the client company suggested.

습식분쇄의 최적조건을 얻고자 부형제 종류, 농도, 습식분쇄시 rotor speed, bead size, feed rate, 분쇄회수를 달리하여 분쇄한 결과, 부형제로는 gum arabic을 사용하여 5%의 농도로 첨가할 때 가장 좋은 분쇄효과를 나타내었다. Rotor speed를 달리하여 습식분쇄한 결과, rotor speed가 증가할수록 좋은 결과를 나타내어 4,000 rpm에서 가장 우수한 것으로 나타났다. 원료와 직접 부딪혀 분쇄를 하게 되는 bead는 0.4 mm의 크기를 사용하였을 때 가장 작은 사이즈로 분쇄되는 것으로 나타났다. 분쇄가 이루어지는 chamber내에 원료를 공급하는 비율에 따른 결과에서는 40 L/h 의 속도로 공급했을 때 가장 작은 입도분포를 보였다. 분쇄회수에 따른 영향은 횟수에 따라서는 8회 이상으로 분쇄하였을때 0.6 μm이하의 입도분포가 90% 이상으로 나타나 10회를 분쇄하였을때 가장 좋은 효과를 나타내었다. 연속운전과 비연속운전의 비교에서는 연속운전이 더 효율적이었으며 부형제 종류에 따른 영향은 gum arabic을 첨가하여 분쇄하였을때 가장 우수한 결과를 나타내었다. 따라서 적절한 농도와 종류의 부형제 사용과 rotor speed, bead size, feed rate, 용매와의 혼합비의 최적공정을 수립한 습식분쇄기술로 초미세액상칼슘의 제조가 가능하였고, 습식분쇄기술을 식품가공기술로 활용할 수 있는 가능성을 확보하였다.

용융탄산염 연료전지(MCFC)의 상용화에 있어서 가장 큰 문제점으로 지적되고 있는 분리판 wet-seal부의 내식성 향상을 위해 AISI 316L 스테인레스강에 Ni은 전기도금법으로, Y과 Al은 e-beam PVD법으로 피복하여 Ni/Y/Al충을 형성시켰다. 800˚C 환원분위기에서 5시간의 열처리를 통해 NiAlY 합금층을 얻을 수 있었으며, 그 후 650˚C 용융탄산염내에서 as-received AISI 316L 스테인레스강과 200시간의 침지실험을 퉁해 내식성이 비교.평가되었다. SEM/EDS를 통한 단면 관찰 결과, Y의 첨가에 의해 치밀한 산화막을 형성하여 분리판 wet-seal부의 내식성을 향상시킬 수 있었다.

콘택 홀 패턴의 미세화가 HF 용액의 침투에 미치는 영향을 파악하고자, 미세 채널 패턴에서의 산화막 습식 식각 특성을 조사하였다. LPCVD로 증착된 산화막을 두께 0.1~1μm, 선폭 0.1~20μm, 그리고 초기 깊이 ~1.2μm 범위의 질화막으로 둘러 쌓인 미세 채널 패터으로 제작한 후, HF용액에 의한 산화막의 식각속도를 관찰하였다. 실험 결과로써, 크기가 0.1 × 0.1 μ m2 초기 깊이가 1.2μm인 고종횡비(~12)의 초미세 패턴에서도 식각 속도가 일정함을 볼 수 있어서, 콘택 홀 패턴의 미세화에 관계없이 반응액의 침투가 원활하게 이루어짐을 알 수 있었다.

전자산업의 발달로 printed circuit board (PCB)와 같은 구리를 함유한 부품의 수요는 증가하고 있으며, 이를 제조 및 가공하는 과정에서 염산 및 질산과 같은 강한 산이 사용되며, 이 때 발생되는 폐산은 많은 양의 구리를 함유한 채 폐기처분된다. PCB 제조 기기의 구리 석막을 제거하기 위하여 사용되는 세척용 질산은 사용 후, 구리를 3~8% 수준으로 함유하고 있으며, 현재 발생되는 폐질산은 가성소다(NaOH)나 소석회(Ca(OH)2)를 이용하여 중화한 후 처리되고 있는 실정이다. 본 연구에서는 폐산 내 존재하는 구리를 탄산구리(CuCO3) 형태로 침전시키기 위하여 소다회(Na2CO3) 및 소석회(Ca(OH)2)를 이용하여 구리를 중화･침전시켜 회수하고, 이를 재자원화하기 위한 금속소재(금속 구리, 산화구리 등)로 제조하는 것을 목적으로 한다. 폐질산으로부터 탄산구리(CuCO3)를 회수하기 위한 반응인자로 사용 약품의 혼합비, 사용량, 침전 pH, 반응 온도를 달리하여 구리의 회수율을 최적화하였다. 또한, 회수된 탄산구리를 고온에서 산화시켜, X-ray diffraction(XRD)을 통한 결정성을 확인하고, 탄산구리를 폐염산에 용해시켜, 철 치환반응을 통한 금속구리를 제조하였다. 구리를 5% 함유한 폐질산으로부터 99.8% 이상 구리를 회수한 최적 조건은 소다회:소석회 혼합비 1:2에서, 혼합약품 사용량 300 g/kg, 침전 pH 6.5, 반응온도 70℃로 도출되었다. 또한, XRD 분석을 통한 고온산화조건은 1,100℃에서 산화구리(CuO) 전환률 99.9%를 나타냈으며, 폐염산에 용해시켜, 철 치환반응을 통해 제조된 금속구리의 구리 순도는 99.8%로 나타났다. 본 연구를 통하여 현재 중화처리 후, 매립되는 구리 자원의 재활용 방안을 도출하였으며, 이를 사업화하기 위하여 추가적 연구가 필요할 것으로 예상된다.